Passage detection apparatus of object

ABSTRACT

A passage detection apparatus  300  is configured to detect the change in the properties (propagation state of sound wave, dielectric constant, etc.) of a specific space  300   a , which changes according to the passage of an object in the specific space  300   a  and the size of the object. The passage detection apparatus  300  includes a pair of detection units  310  and  320  configured to transmit and receive signals to and from an external device. The specific space  300   a  is formed by the space between the detection unit  310  and the detection unit  320 . The detection unit  310  is supported by a first substrate  330 . The detection unit  320  is supported by a second substrate  340  that is parallel to the first substrate  330 , and arranged at the position corresponding to the detection unit  310  supported by the first substrate  330.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a passage detection apparatus of anobject that can detect a passage of the object in a specific space.

2. Description of the Related Art

For example, various methods of manufacturing a so-called DNA chip (aDNA micro array) are well known. The DNA chip is generally constructedby arraying and fixing micro spots of several thousand to ten thousandor more kinds of different DNA pieces on a substrate, such as microscopeslide glass, with high density.

As examples of the DNA chip manufacturing methods, there have beenproposed methods of manufacturing a DNA chip using a micropipette forejecting drops having micro volume (for example, Japanese PatentApplication Laid-Open (kokai) No. 2001-124789, 2001-186881). Themicropipette includes an injection port for injecting a sample solutionfrom the outside, a cavity for allowing the sample solution injectedfrom the injection port to be filled therein, an ejection portcommunicating with the cavity, and a piezoelectric/electrostrictiveelement constructed to change the interior volume of the cavity suchthat the sample solution can be ejected from the ejection port.

According to the above-described DNA chip manufacturing methods, theinterior volume of the cavity is changed by the driving operation of thepiezoelectric/electrostrictive element. As the interior volume of thecavity is changed, the sample solution moves from the cavity to theejection port in the form of a streamline flow. That is, a predeterminedamount of the sample solution is delivered from the cavity to theejection port. As the predetermined amount of the sample solution isejected from the ejection port, micro drops of the sample solution aregenerated. The micro drops of the sample solution ejected from themicropipette are attached to the substrate, and the micro drops arearrayed and fixed on the substrate as micro spots. In this way, the DNAchip is manufactured.

An apparatus constructed to eject a micro object (hereinafter, simplyreferred to as a “micro object ejection apparatus”), such as themicropipette used in the DNA chip manufacturing method as describedabove, may be utilized in various technical fields.

SUMMARY OF THE INVENTION

In this kind of the micro object ejection apparatus, the dried andhardened portion of the micro object or foreign matter might be attachedaround the ejection port, and as a result, the ejection port may beobstructed. In this case, the micro object may not be accurately ejectedtoward a predetermined position to which the micro object is to beejected (for example, see columns [0010] and [0019] of Japanese PatentApplication Laid-Open (kokai) No. 2001-124789).

Therefore, the present invention has been made in view of the aboveproblems, and it is an object of the present invention to provide apassage detection apparatus of an object that is capable of detectingthe passage of the micro object in a specific space through which themicro object should pass when the micro object is ejected, in order tograsp the ejection state of the micro object in the micro objectejection apparatus, the passage detection apparatus of an object beingmanufactured in a simplified structure and at low costs.

(Configuration a: Sonic Type)

In order to achieve the foregoing object, the passage detectionapparatus of an object (hereinafter simply referred to as “passagedetection apparatus”) includes the following configurations.

(A01) The passage detection apparatus according to the present inventionincludes a vibration generating source, a sensor unit, and adetermination unit. The vibration generating source is configured to becapable of generating vibration that is propagated in the specificspace. Ultrasonic wave is preferable for the vibration. The sensor unitis arranged at the position corresponding to the vibration generatingsource across the specific space, and is configured to be capable ofgenerating an output according to the vibration propagating via a mediumin the specific space. The determination unit is configured to determinethe passage of the object in the specific space on the basis of theoutput from the sensor unit.

In the configuration described above, the propagation state of thevibration at the medium (e.g., air) in the specific space changesdepending upon the presence of the object. Accordingly, thedetermination unit can determine whether the object passes or not in thespecific space on the basis of the change in the output (e.g., outputvoltage) by the sensor unit, for example. The propagation state at themedium (e.g., air) in the specific space also changes according to thesize of the object. Therefore, the determination unit can also determinethe size of the object.

(A02) In the above-mentioned configuration A01, the vibration generatingsource and the sensor unit may be comprised of apiezoelectric/electrostrictive element. Specifically, the vibrationgenerating source is comprised of a first piezoelectric/electrostrictiveelement having a first dielectric layer, and a drive electrode and afirst reference electrode that are formed at both sides of the firstdielectric layer. The sensor unit is comprised of a secondpiezoelectric/electrostrictive element having a second dielectric layer,and a signal output electrode and a second reference electrode that areformed at both sides of the second dielectric layer.

In this configuration, since a drive voltage is applied between thefirst reference electrode and the drive electrode, the vibration isgenerated from the first piezoelectric/electrostrictive element on thebasis of the inverse piezoelectric effect. This vibration is propagatedto the second piezoelectric/electrostrictive element through the medium.By this vibration, the output voltage is generated between the secondreference electrode and the signal output electrode on the basis of thepiezoelectric effect. The determination unit determines whether theobject passes in the specific space or not and/or determines the size ofthe object on the basis of the output voltage. According to thisconfiguration, whether the object passes or not in the specific spaceand/or the size of the object can surely be determined with simplestructure, regardless of the conductivity of the object.

(A03) In the above-mentioned configuration A02, the vibration generatingsource and the sensor unit may be arranged such that the first referenceelectrode and the second reference electrode are arranged at the sideclose to the specific space. In this case, the passage detectionapparatus is configured such that the first reference electrode and thesecond reference electrode arranged at both side of the specific spaceso as to face the specific space have the same potential. Alternatively,the passage detection apparatus is configured such that the firstreference electrode and the second reference electrode have differentpotential.

When the first reference electrode and the second reference electrode,which are arranged at both sides of the specific space so as to face thespecific space, have the same potential (e.g., when the first referenceelectrode and the second reference electrode are both grounded), theelectric field intensity between the first reference electrode and thesecond reference electrode becomes nearly zero. Therefore, when theobject is electrostatically charged (e.g., in cases where the object isa water-based micro drop), it can be prevented that the flight route ofthe object is curved by moving the object toward the side of the firstreference electrode or the second reference electrode during the passagein the specific space. Accordingly, even when the object iselectrostatically charged, the passage of the object or the size of theobject can satisfactorily be determined.

When a potential difference is formed between the first referenceelectrode and the second reference electrode arranged at both sides ofthe specific space so as to face the specific space, the detectionsensitivity of the passage of the object in the specific space isfurther enhanced. Specifically, electrostatic capacity changes in thespecific space depending upon whether the object passes through thespecific space or not or depending upon the property of the object. Theabove-mentioned potential difference (voltage) can be varied on thebasis of the change in the electrostatic capacity. The use of thevariation in the voltage and the change in the vibration propagationstate makes it possible to detect the passage of the object in thespecific space or the property of the object with higher sensitivity(the operation and effect same as those achieved by the later-describedconfiguration in D01 can be provided.).

(A04) In the configurations A02 and A03, a first substrate made of aplate-like dielectric layer and supporting the firstpiezoelectric/electrostrictive element and a second substrate made of aplate-like dielectric layer and supporting the secondpiezoelectric/electrostrictive element may be further provided. In thiscase, the specific space is formed from a space between the firstsubstrate and the second substrate. Ceramic or the like is preferablyused, for example, as the dielectric layer composing the first substrateand the second substrate.

According to the configuration described above, the firstpiezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element are surely be supported by thefirst substrate and the second substrate. Therefore, the vibrationtoward the medium from the first piezoelectric/electrostrictive elementcan more efficiently be propagated. Further, the vibration from themedium can more efficiently be received by the secondpiezoelectric/electrostrictive element. Moreover, the specific spacethat has the microstructure and through which the object passes cansurely be formed to have a desired shape and size.

(A05) In the above-mentioned configuration A04, the firstpiezoelectric/electrostrictive element may be held on an inner surface,which is the surface at the side of the specific space, of the firstsubstrate, and the second piezoelectric/electrostrictive element may beheld on an inner surface, which is the surface at the side of thespecific space, of the second substrate. Specifically, the firstpiezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element may be arranged so as to face thespecific space.

In the configuration described above, the space between the firstpiezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element forms the specific space. Thevibration is propagated to the second piezoelectric/electrostrictiveelement from the first piezoelectric/electrostrictive element throughthe medium in the specific space. Accordingly, the passage of the objectand/or the size of the object can be determined with excellentsensitivity by a simplified structure.

(A06) In the above-mentioned configuration A04, the firstpiezoelectric/electrostrictive element may be held on an outer surface,which is the surface reverse to an inner surface at the side of thespecific space, of the first substrate, and the secondpiezoelectric/electrostrictive element may be held on an outer surface,which is the surface reverse to an inner surface at the side of thespecific space, of the second substrate.

In the configuration described above, the first substrate and the secondsubstrate are arranged in such a manner that the inner surfaces of thefirst substrate and the second substrate face the specific space (insuch a manner that the first piezoelectric/electrostrictive element andthe second piezoelectric/electrostrictive element are not exposed to thespecific space). Thus, the passage of the object and/or the size of theobject can satisfactorily be determined, even when the object is liquidor conductive. It is to be noted that the inner surfaces of the firstsubstrate and the second substrate may be exposed to the specific space,or a coating layer made of an insulating material may be formed on theinner surfaces.

(A07) In the above-mentioned configuration A05, a coating layer made ofan insulating material may be formed so as to cover the firstpiezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element.

According to this configuration, a stable performance can be obtained,even if the passage detection apparatus is used under high-humidenvironment.

When the first piezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element are arranged so as to face thespecific space and the object is liquid or conductive, the object isprevented from being directly deposited onto the firstpiezoelectric/electrostrictive element or the secondpiezoelectric/electrostrictive element. Accordingly, the occurrence ofshort-circuit between the first reference electrode and the driveelectrode can be prevented. Further, the occurrence of short-circuitbetween the second reference electrode and the signal output electrodecan be prevented. Accordingly, the passage of the object and/or the sizeof the object can satisfactorily be determined, even when the object isliquid or conductive.

(A08) In the above-mentioned configurations A04 to A06, the firstsubstrate and the second substrate may be arranged such that thedistance L in the widthwise direction of the specific space (thedirection perpendicular to the moving direction of the object and thedirection forming the shortest distance between the first substrate andthe second substrate) satisfies the equation of L=nλ or L=(m/2)·λ,wherein the wavelength of the vibration propagating through the mediumis defined as λ, and n and m are defined as a natural number. Inparticular, in the above-mentioned configuration A05, the firstsubstrate and the second substrate may be arranged in such a manner thatthe distance between the inner surface of the first substrate and theinner surface of the second substrate becomes the distance L.Accordingly, the vibration from the first piezoelectric/electrostrictiveelement to the second piezoelectric/electrostrictive element can moreefficiently be propagated.

(A09) In the above-mentioned configurations A04 to A08, the firstsubstrate may include a plate-like thin part and a plate-like thick partthat is formed at both sides of the thin part and is thicker than thethin part, wherein the first piezoelectric/electrostrictive element maybe attached to the thin part of the first substrate.

In the above-mentioned configuration, the first substrate is formed insuch a manner that the thin part is bridged between the adjacent thickparts. Therefore, the vibration can be generated from the firstpiezoelectric/electrostrictive element, serving as the vibrationgenerating source, with high output.

It is to be noted that the thin part and thick part may be integrallyformed from the same material. Alternatively, the thin part is made of amaterial different from the material of the thick part. In this case,the thin part may be integrally formed with the thick part with asintering or the like, or may be fixed to the thick part by bonding orwelding.

(A10) In the above-mentioned configuration A09, the first substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be formed to include a space enclosed by an innersurface of the thin part at the first substrate and a side face of thethick part at the first substrate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the first substrate, and the thin part is formed so as to bebridged between the adjacent thick parts at the outer side of the firstsubstrate. Therefore, a part of the specific space can be formed withinthe range of the thickness of the first substrate. Accordingly, thepassage detection apparatus can be miniaturized.

(A11) In the above-mentioned configuration A10, the side face of thethick part at the first substrate may be configured to be capable ofreflecting sound wave or ultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of theconcave part forming the specific space. Therefore, directivity when theultrasonic wave or the like propagates through the medium is enhanced.Accordingly, the passage of the object or the like can satisfactorily bedetected even though the input voltage in the firstpiezoelectric/electrostrictive element, which serves as the vibrationgenerating source, is reduced to decrease the power consumption.

(A12) In the above-mentioned configurations A04 to A11, the secondsubstrate may include a thin part and a thick part, and the sensor unitand the second electrode may be attached to the thin part of the secondsubstrate. The thin part is formed into a flat plate shape. The thickpart is a member having a flat plate shape thicker than the thin part.The thick part is formed at both sides of the thin part.

According to the configuration described above, the second substrate isformed in such a manner that the thin part is bridged between theadjacent thick parts. Therefore, the thin part can be vibrated with highefficiency by the vibration propagating through the medium. Accordingly,the passage of the object or the like can be detected with highsensitivity.

(A13) In the above-mentioned configuration A12, the second substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be configured to include a space enclosed by an innersurface of the thin part at the second substrate and a side face of thethick part at the second substrate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the second substrate, and the thin part is formed so as to bebridged between the adjacent thick parts at the outer side of the secondsubstrate. Therefore, a part of the specific space can be formed withinthe range of the thickness of the second substrate. Accordingly, thepassage detection apparatus can be miniaturized. In particular, nearlyentire specific space can be formed within the range of the thicknessobtained by superimposing the first and second substrates by theconfiguration in which the first substrate is formed in the same manneras the second substrate (refer to the configuration A09). Therefore, thepassage detection apparatus can further be miniaturized.

(A14) In the above-mentioned configuration A13, the side face of thethick part at the second substrate may be formed to be smooth to anextent of being capable of nearly totally reflecting sound wave orultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of theconcave part composing the specific space. Therefore, directivity whenthe ultrasonic wave or the like propagates through the medium isenhanced. Accordingly, the thin part can be vibrated with highefficiency by the vibration propagating through the medium. Inparticular, it is preferable that the first substrate is formed in thesame manner as the second substrate (refer to the configuration A10).Accordingly, the vibration from the first piezoelectric/electrostrictiveelement to the second piezoelectric/electrostrictive element in thespecific space formed at the inner side of the portion where the firstand the second substrates are superimposed can be propagated with highdirectivity.

(A15) In any one of the above-mentioned configurations A04 to A14 thefirst substrate and the first piezoelectric/electrostrictive element maybe integrally formed by sintering, and the second substrate and thesecond piezoelectric/electrostrictive element may be integrally formedby sintering. Accordingly, the fixing force between each substrate tothe corresponding piezoelectric/electrostrictive element is enhanced.Consequently, a passage detection apparatus having high durability canbe obtained by a simple manufacturing process.

(A16) In any one of the above-mentioned configurations A01 to A15, thevibration generating source may be comprised of apiezoelectric/electrostrictive element having a multi-layer structure.

According to the configuration described above, the output of thevibration from the vibration generating source can be more increased.Therefore, the passage of the object and/or the size of the object cansatisfactorily be detected.

(Configuration B: Sonic Type/Electrostatic Microphone Sensor Unit)

The passage detection apparatus having the configuration A01 may beconfigured as follows.

(B01) The sensor unit includes a vibration plate, a first detectionelectrode, a support plate, and a second detection electrode. Thevibration plate is made of a plate-like dielectric layer. The vibrationplate is a member composing the outer wall enclosing the specific space.The first detection electrode is mounted to the vibration plate. Thesupport plate is arranged parallel to the vibration plate with apredetermined gap. The second detection electrode is formed on an innersurface of the support plate opposite to the vibration plate, and isarranged parallel to the first detection electrode. The determinationunit is configured to be capable of determining the passage of theobject in the specific space on the basis of an electrostaticcapacitance between the first detection electrode and the seconddetection electrode.

In the configuration described above, the propagation state of thevibration of the medium toward the vibration plate in the specific spacechanges depending upon the presence of the object or the size of theobject. Therefore, the vibration state of the vibration plate changesaccording to the presence of the object or the size of the object. Bythe change in the vibration state of the vibration plate, the manner ofchange in the electrostatic capacitance (or impedance) of a virtualcapacitor comprised of the first detection electrode and the seconddetection electrode changes. The determination unit determines thepassage of the object and/or the size of the object on the basis of thechange in the electrostatic capacitance. Accordingly, the determinationunit can determine the passage of the object in the specific spaceand/or the size of the object on the basis of the change in the partialvoltage of a virtual capacitor C4 in the circuit in which a capacitor C3having the predetermined capacitance and the virtual capacitor C4 areserially connected, for example. Specifically, the sensor unit havingthe structure described above is configured to convert the vibrationstate of the vibration plate and its change into an electrical signal.Accordingly, the structure of the sensor unit described above issometimes referred to as a structure of an “electrostatic microphone”(the configurations B02 to B13 described below describe the variationsof the configuration B1 of the passage detection apparatus when thesensor unit has the structure of the “electrostatic microphone”).

In the configuration described above, various materials can be selectedas the vibration plate. For example, a film of synthetic resin can beused as the vibration plate. In this case, the first detection electrodecan easily be made into a thin film. Thus, the overall rigidity of thevibration plate and the first detection electrode is reduced, so thatthe vibration plate greatly vibrates even by a very small vibration ofthe medium. Therefore, the slight change of the vibration state of themedium can appear as the great change of the vibration state of thevibration plate. Accordingly, the sensitivity of detecting the passageof the object by the passage detection apparatus is further enhanced.

(B02) In the above-mentioned configuration B01, the vibration generatingsource may be comprised of a piezoelectric/electrostrictive element.Specifically, in this case, the vibration generating source is comprisedof a first piezoelectric/electrostrictive element having a firstdielectric layer, and a drive electrode and a first reference electrodethat are formed at both sides of the first dielectric layer.

In this configuration, since a drive voltage is applied between thefirst reference electrode and the drive electrode, the vibration isgenerated from the first piezoelectric/electrostrictive element on thebasis of the inverse piezoelectric effect. This vibration is propagatedto the second piezoelectric/electrostrictive element through the medium.The determination unit determines whether the object passes in thespecific space or not and/or determines the size of the object on thebasis of the change of the vibration state of the vibration plate.According to this configuration, whether the object passes through thespecific space or not and/or the size of the object can surely bedetermined with simplified structure, regardless of the conductivity ofthe object.

(B03) In the above-mentioned configuration B02, the first substrate andthe first piezoelectric/electrostrictive element may be integrallyformed by sintering. Accordingly, the fixing force between the firstsubstrate to the first piezoelectric/electrostrictive element isenhanced. Consequently, a passage detection apparatus having highdurability can be obtained by a simple manufacturing process.

(B04) In any one of the above-mentioned configurations B01 to B03, afirst substrate made of a plate-like dielectric layer and supporting thevibration generating source (the first piezoelectric/electrostrictiveelement) may further be provided, and the specific space may be formedfrom the space between an inner surface of the first substrate and aninner surface of the vibration plate. In this case, the specific spaceis formed from the space between the first substrate and the vibrationplate. Ceramic or the like is preferably used for the dielectric layercomposing the first substrate and the vibration plate, for example.

According to the configuration described above, the vibration generatingsource (the first piezoelectric/electrostrictive element) is surely besupported by the first substrate. Therefore, the vibration toward themedium from the vibration generating source can more efficiently bepropagated. Moreover, the specific space that has the microstructure andthrough which the object passes can surely be formed to have a desiredshape and size.

(B05) In the above-mentioned configuration B04, the vibration generatingsource (the first piezoelectric/electrostrictive element) may be held onan outer surface, which is the surface reverse to the inner surface, ofthe first substrate.

In the configuration described above, the first substrate is arranged insuch a manner that the inner surfaces of the first substrate and thevibration plate face the specific space (in such a manner that thevibration generating source is not exposed to the specific space). Thus,the passage of the object and/or the size of the object cansatisfactorily be determined, even when the object is liquid orconductive. When the object is solid, the passage of the object can bedetected with enhanced sensitivity. It is to be noted that the innersurfaces of the first substrate and the vibration plate may be exposedto the specific space, or a coating layer made of an insulating materialmay be formed on the inner surfaces.

(B06) In any one of the above-mentioned configurations B04 and B05, thefirst substrate and the second substrate may be arranged such that thedistance L in the widthwise direction of the specific space (thedirection perpendicular to the moving direction of the object and thedirection forming the shortest distance between the first substrate andthe second substrate) satisfies the equation of L=n, or L=(m/2)·λ,wherein the wavelength of the vibration propagating through the mediumis defined as λ, and n and m are defined as a natural number. Inparticular, in the above-mentioned configuration B03, the firstsubstrate and the vibration plate may be arranged in such a manner thatthe distance between the inner surface of the first substrate and theinner surface of the vibration plate becomes the distance L.Accordingly, the vibration can more efficiently be propagated.

(B07) In any one of the above-mentioned configurations B04 to B06, thefirst substrate may include a plate-like thin part and a plate-likethick part that is formed at both sides of the thin part and is thickerthan the thin part, wherein the vibration generating source may beattached to the thin part of the first substrate.

In the above-mentioned configuration, the first substrate is formed insuch a manner that the thin part is bridged between the adjacent thickparts. Therefore, the thin part is efficiently vibrated by the vibrationgenerating source (the first piezoelectric/electrostrictive element),whereby the vibration with high output can be propagated through themedium in the specific space.

It is to be noted that the thin part and thick part may be integrallyformed from the same material. Alternatively, the thin part may be madeof a material different from the material of the thick part. In thiscase, the thin part may be integrally formed with the thick part with asintering or the like, or may be fixed to the thick part by bonding orwelding.

(B08) In the above-mentioned configuration B07, the first substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be formed to include a space enclosed by an innersurface of the thin part at the first substrate and a side face of thethick part at the first substrate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the first substrate. Therefore, a part of the specific spacecan be formed within the range of the thickness of the first substrate.Accordingly, the passage detection apparatus can be miniaturized.

(B09) In the above-mentioned configuration B08, the side face of thethick part at the first substrate may be configured to be capable ofreflecting sound wave or ultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of theconcave part forming the specific space. Therefore, directivity when theultrasonic wave or the like propagates through the medium is enhanced.Accordingly, the passage of the object or the like can satisfactorily bedetected even though output of the vibration generating source isreduced to decrease the power consumption.

(B10) In any one of the above-mentioned configurations B01 to B09, thesensor unit may be configured such that thick plates which areplate-like members and are thicker than the vibration plate are arrangedat both ends of the vibration plate forming the electrostatic microphoneat the sensor unit, wherein the vibration plate is supported by thethick plates.

According to the configuration described above, the vibration plate isbridged between the adjacent thick plates. Therefore, the vibrationplate can be vibrated with high efficiency by the vibration propagatingthrough the medium. Accordingly, the passage of the object or the likecan be detected with high sensitivity.

(B11) In the above-mentioned configuration B10, the vibration plate andthe thick plate may be integrally configured such that an outer surfaceof the vibration plate and an outer surface of the thick plate arecontinuous on a same plane, and the specific space may be configured toinclude a space enclosed by the inner surface of the vibration plate anda side face of the thick plate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the vibration plate. The concave part is formed within therange of the thickness of the thick plate. Therefore, a part of thespecific space can be formed within the range of the thickness of thethick plate. Accordingly, the passage detection apparatus can beminiaturized. In particular, when the first substrate is configured in asimilar fashion (refer to the configuration B07), nearly entire specificspace can be formed within the range of the thickness obtained bysuperimposing the first substrate and the thick plate. Consequently, thepassage detection apparatus can further be miniaturized.

(B12) In the above-mentioned configuration B11, the side face of thethick plate may be formed to be smooth to an extent of being capable ofnearly totally reflecting sound wave or ultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of thespecific space formed by the side face of the thick plate. Therefore,directivity when the ultrasonic wave or the like propagates through themedium is enhanced. Accordingly, the thin part can be vibrated with highefficiency by the vibration propagated through the medium. Inparticular, it is preferable that the first substrate has the samestructure (refer to the configuration B08). Accordingly, the vibrationin the specific space formed at the inner side of the portion where themember comprised of the vibration plate and the thick plate and thefirst substrates are superimposed can be propagated with highdirectivity.

(B13) In any one of the above-mentioned configurations B01 to B12, thevibration generating source may be comprised of apiezoelectric/electrostrictive element having a multi-layer structure.

According to the configuration described above, the output of thevibration from the vibration generating source can be more increased.Therefore, the passage of the object and/or the size of the object cansatisfactorily be detected.

(Configuration C: Electrostatic Capacitive Sensor Type)

In order to achieve the foregoing object, the passage detectionapparatus according to the present invention includes the followingconfigurations.

(C01) The passage detection apparatus according to the present inventionincludes a plate-like first electrode, a plate-like second electrodearranged parallel to the first electrode across the specific space, anda determination unit that is configured to determine the passage of amicro object (hereinafter simply referred to as “the object”) in thespecific space on the basis of the electrostatic capacitance between thefirst electrode and the second electrode.

In the configuration described above, the electrostatic capacitance (orimpedance) of a virtual capacitor comprised of the first electrode, thesecond electrode, and the medium (e.g., air) in the specific spacechanges according to the presence of the object. Therefore, thedetermination unit can determine whether the object passes through thespecific space by acquiring the change in the partial voltage of thevirtual capacitor C2 in the circuit in which a capacitor C1 having thepredetermined capacitance and the virtual capacitor C2 are seriallyconnected, for example.

The electrostatic capacitance of the virtual capacitor also changesaccording to the size of the object. Accordingly, the determination unitcan determine the size of the object on the basis of the partial voltageof the virtual capacitor C2.

(C02) In the above-mentioned configuration C01, a first electrodesupport layer that is made of a plate-like dielectric layer and supportsthe first electrode and a second electrode support layer that is made ofa plate-like dielectric layer and supports the second electrode mayfurther be provided. In this case, the specific space is made by a spacebetween an inner surface, which is the surface at the side of thespecific space, of the first electrode support layer and an innersurface, which is the surface at the side of the specific space, of thesecond electrode support layer. Ceramic is preferably used for thedielectric layer composing the first electrode support layer and thesecond electrode support layer, for example.

According to the configuration described above, the first electrode andthe second electrode are surely supported by the first electrode supportlayer and the second electrode support layer. Therefore, the distancebetween the first electrode and the second electrode can surely be setto a desired distance. Accordingly, the specific space that has amicrostructure and through which the object passes can surely be formedinto a desired shape and size. Also, since the distance between theelectrodes in the virtual capacitor is stably formed, whether theobjects passes or not or the size of the object can more correctly bedetermined.

(C03) In the above-mentioned configuration C02, the first electrode maybe supported on the inner surface of the first electrode support layerand the second electrode may be supported on the inner surface of thesecond electrode support layer.

In the configuration described above, the first electrode is supportedby the first electrode support layer so as to face the specific space,while the second electrode is supported by the second electrode supportlayer so as to face the specific space. The virtual capacitor iscomprised of the first electrode, the second electrode, and the medium(e.g., air) in the specific space, so that the first electrode supportlayer and the second electrode support layer do not compose the virtualcapacitor. Accordingly, the passage of the object and/or the size of theobject can be determined with excellent sensitivity with a simplifiedstructure.

(C04) In the above-mentioned configuration C03, it is preferable that acoating layer made of an insulating material is formed on the innersurfaces of the first electrode support layer and the second electrodesupport layer so as to cover the first electrode and the secondelectrode. By virtue of this configuration, the passage of the objectand/or the size of the object can be satisfactorily determined even whenthe object is liquid or conductive.

(C05) In the above-mentioned configuration C02, the first electrode maybe formed on an outer surface, which is reverse to the inner surface, ofthe first electrode support layer, and the second electrode may beformed on an outer surface, which is reverse to the inner surface, ofthe second electrode support layer.

In the configuration described above, the first electrode support layerand the second electrode support layer are arranged in such a mannerthat the inner surfaces of the first electrode support layer and thesecond electrode support layer face the specific space (in such a mannerthat the first electrode and the second electrode are not exposed to thespecific space). Thus, the passage of the object and/or the size of theobject can satisfactorily be determined, even when the object is liquidor conductive. It is to be noted that the inner surfaces of the firstelectrode support layer and the second electrode support layer may beexposed to the specific space, or a coating layer made of an insulatingmaterial may be formed on the inner surfaces.

(Configuration D: Sound Wave+Electrostatic Capacitive Sensor Type)

In order to achieve the foregoing object, the passage detectionapparatus according to the present invention includes the followingconfigurations.

(D01) The passage detection apparatus according to the present inventionincludes a vibration generating source, a vibration sensor unit, a firstelectrode, a second electrode, and a determination unit. The vibrationsensor unit is arranged at the position corresponding to the vibrationgenerating source across the specific space, and is configured to becapable of generating an output according to the vibration propagatingvia a medium in the specific space. The second electrode is arrangedparallel to the plate-like first electrode across the specific space.The determination unit is configured to determine the passage of theobject in the specific space on the basis of the output at the vibrationsensor unit, and the electrostatic capacitance between the firstelectrode and the second electrode.

In the configuration described above, the propagation state of thevibration of the medium in the specific space changes depending upon thepresence of the object. Accordingly, the determination unit candetermine whether the object passes or not in the specific space on thebasis of the change in the output (e.g., output voltage) by thevibration sensor unit, for example. The propagation state of thevibration at the medium (e.g., air) in the specific space also changesaccording to the size of the object. Therefore, the determination unitcan also determine the size of the object.

The electrostatic capacitance (or impedance) of a virtual capacitorcomprised of the first electrode, the second electrode, and the medium(e.g., air) in the specific space changes according to the presence ofthe object. Therefore, the determination unit can determine whether theobject passes through the specific space by acquiring the change in thepartial voltage of the virtual capacitor C2 in the circuit in which thecapacitor C1 having the predetermined capacitance and the virtualcapacitor C2 are serially connected, for example. The electrostaticcapacitance of the virtual capacitor also changes according to the sizeof the object. Accordingly, the determination unit can determine thesize of the object on the basis of the partial voltage of the virtualcapacitor C2.

As described above, the passage detection apparatus according to thepresent invention employs the configuration in which a structure of aso-called electrostatic capacitive sensor type (refer to theconfigurations C01˜C05) and a structure of a so-called sonic(ultrasonic) sensor (refer to the configurations A01˜A16, B01˜B13) arecombined.

In the configuration described above, the electrical signal outputtedfrom the first electrode and the second electrode in the electrostaticcapacitive sensor structure is based upon dielectric constant of theobject passing through the specific space. On the other hand, theelectrical signal outputted from the vibration sensor unit in the sonic(ultrasonic) sensor is based upon the rheology characteristic of theobject passing through the specific space, such as density, etc. Theoutput from the structure of the electrostatic capacitive sensor and theoutput from the structure of the sonic (ultrasonic) sensor are basedupon the different characteristic of the object passing through thespecific space.

Therefore, in this configuration, the determination unit can determinewhether the object passes through the specific space or not and/or thesize of the object on the basis of the detection value in the structureof the electrostatic capacitive sensor and the detection value in thestructure of the sonic (ultrasonic) sensor. Specifically, for example,the determination unit can determine the passage of the object and/orthe size of the object by performing an appropriate statistic processsuch as averaging on the basis of one detection value and the otherdetection value. Alternatively, the determination unit can determine thepassage of the object and/or the size of the object by appropriatelyselecting one of the detection values according to the situation.

The determination unit alternatively can determine the passage of theobject and/or the size of the object on the basis of the waveform of theelectric signal obtained by performing an appropriate process on theelectric circuit (superimposition, filtering, etc.) to the electricsignal outputted from the vibration sensor in the structure of the sonic(ultrasonic) sensor and the electric signal outputted from the first andsecond electrodes in the structure of the electrostatic capacitivesensor.

The processing method of the electric signals outputted from thevibration sensor in the structure of the sonic (ultrasonic) sensor andthe first and second electrodes in the structure of the electrostaticcapacitive sensor is not particularly limited in the presentconfiguration.

According to the present configuration, the passage of the object and/orthe size of the object can be detected with enhanced reliability byusing the electric signal outputted from the vibration sensor in thestructure of the sonic (ultrasonic) sensor and the electric signaloutputted from the first and second electrodes in the structure of theelectrostatic capacitive sensor, regardless of the property (size orchargeability) of the object.

In the passage detection apparatus according to the present invention,various structures that can be employed in the structure of theelectrostatic capacitive sensor (refer to the configurations C02˜C05)and the various structures (refer to the configurations A02˜B12) thatcan be employed in the structure of the sonic (ultrasonic) sensor can beemployed as combined within the scope of consistency.

(D02) In the above-mentioned configuration D01, a first substrate madeof a plate-like dielectric layer and supporting the vibration generatingsource and the first electrode and a second substrate made of aplate-like dielectric layer and supporting the vibration sensor unit andthe second electrode may be further provided. In this case, the specificspace is formed from a space between an inner surface of the firstsubstrate and an inner surface of the second substrate. Ceramic or thelike is preferably used, for example, as the dielectric layer composingthe first substrate and the second substrate.

According to the configuration described above, the specific space thathas a microstructure and through which the object passes can surely beformed into a desired shape and size.

In the configuration described above, the vibration generating sourceand the first electrode are surely supported by the first substrate, andthe vibration sensor and the second electrode are surely supported bythe second substrate. Therefore, the vibration toward the medium fromthe vibration generating source can more efficiently be propagated.Further, the vibration from the medium can more efficiently be receivedby the vibration sensor. Moreover, since the distance between the firstelectrode and the second electrode is set to a desired distance, and thedistance between the electrodes in the virtual capacitor is stablyformed, whether the objects passes or not or the size of the object canmore correctly be determined.

(D03) The passage detection apparatus having the configuration D02 maybe configured as follows. The vibration generating source is comprisedof a first piezoelectric/electrostrictive element having a firstdielectric layer, and a drive electrode and a first reference electrodethat are formed at both sides of the first dielectric layer. Thevibration sensor unit is comprised of a secondpiezoelectric/electrostrictive element having a second dielectric layer,and a signal output electrode and a second reference electrode that areformed at both sides of the second dielectric layer.

The first electrode composing the electrostatic capacitive sensor iscomprised of the drive electrode or the first reference electrode in thefirst piezoelectric/electrostrictive element, whichever is closer to thesecond piezoelectric/electrostrictive element. Further, the secondelectrode composing the electrostatic capacitive sensor is comprised ofthe signal output electrode or the second reference electrode in thesecond piezoelectric/electrostrictive element, whichever is closer tothe first piezoelectric/electrostrictive element.

According to this configuration, the passage detection apparatusaccording to the present invention having the structure in which thestructure of the electrostatic capacitive sensor and the structure ofthe sonic (ultrasonic) sensor are combined can be provided with asimplified structure.

(D04) In the above-mentioned configuration D03, the firstpiezoelectric/electrostrictive element and the first electrode may besupported on an inner surface of the first substrate that is the surfaceat the side of the specific space, and the secondpiezoelectric/electrostrictive element and the second electrode may besupported on an inner surface of the second substrate that is thesurface at the side of the specific space.

In the configuration described above, the firstpiezoelectric/electrostrictive element and the secondpiezoelectric/electrostrictive element are arranged so as to face thespecific space. Further, the first electrode and the second electrodeare arranged so as to face the specific space. The space between thefirst electrode and the second electrode forms the specific space, andthe vibration is propagated from the firstpiezoelectric/electrostrictive element to the secondpiezoelectric/electrostrictive element through the medium in thespecific space. The change in the electrostatic capacitance in the spacebetween the first electrode and the second electrode is also detected.Therefore, the passage of the object and/or the size of the object canbe determined with enhanced sensitivity by a simplified structure.

(D05) In the above-mentioned configuration D04, a coating layer made ofan insulating material may be formed so as to cover the firstpiezoelectric/electrostrictive element, the secondpiezoelectric/electrostrictive element, the first electrode, and thesecond electrode.

According to this configuration, a stable performance can be obtained,even if the passage detection apparatus is used under high-humidenvironment.

The object is prevented from being directly deposited onto the firstpiezoelectric/electrostrictive element, the secondpiezoelectric/electrostrictive element, the first electrode, and thesecond electrode, when the object is liquid or conductive. Accordingly,the occurrence of short-circuit between the electrodes having adifferent potential can be prevented. Accordingly, the passage of theobject and/or the size of the object can satisfactorily be determined,even when the object is liquid or conductive.

(D06) In the above-mentioned configuration D03, the firstpiezoelectric/electrostrictive element and the first electrode may beheld on an outer surface, which is reverse to an inner surface at theside of the specific space, of the first substrate, and the secondpiezoelectric/electrostrictive element and the second electrode may beheld on an outer surface, which is reverse to an inner surface at theside of the specific space, of the second substrate.

In the configuration described above, the first substrate and the secondsubstrate are arranged in such a manner that the inner surfaces of thefirst substrate and the second substrate face the specific space (insuch a manner that the first piezoelectric/electrostrictive element, thesecond piezoelectric/electrostrictive element, the first electrode, andthe second electrode are not exposed to the specific space). Thus, thepassage of the object and/or the size of the object can satisfactorilybe determined, even when the object is liquid or conductive. It is to benoted that the inner surfaces of the first substrate and the secondsubstrate may be exposed to the specific space, or a coating layer madeof an insulating material may be formed on the inner surfaces.

(D07) In any one of the above-mentioned configurations D03 to D06, thefirst substrate and the second substrate may be arranged such that thedistance L in the widthwise direction of the specific space (thedirection perpendicular to the moving direction of the object and thedirection forming the shortest distance between the first substrate andthe second substrate) satisfies the equation of L=nλ or L=(m/2) λ,wherein the wavelength of the vibration propagating through the mediumis defined as λ, and n and m are defined as a natural number. Inparticular, in the above-mentioned configuration D07, the firstsubstrate and the second substrate may be arranged in such a manner thatthe distance between the inner surface of the first substrate and theinner surface of the second substrate becomes the distance L.Accordingly, the vibration from the first piezoelectric/electrostrictiveelement to the second piezoelectric/electrostrictive element can moreefficiently be propagated.

(D08) In any one of the configurations D03 to D7, the first substrate,the first piezoelectric/electrostrictive element, and the firstelectrode may be integrally formed by sintering, and the secondsubstrate, the second piezoelectric/electrostrictive element, and thesecond electrode may be integrally formed by sintering. Accordingly, thefixing force between each substrate to the correspondingpiezoelectric/electrostrictive element and the corresponding electrodeis enhanced. Consequently, a passage detection apparatus having highdurability can be obtained by a simple manufacturing process.

(D09) In any one of the above-mentioned configurations D03 to D08, thefirst substrate may include a plate-like thin part and a plate-likethick part that is formed at both sides of the thin part and is thickerthan the thin part, wherein the vibration generating source and thefirst electrode may be attached to the thin part of the first substrate.

In the above-mentioned configuration, the first substrate is formed insuch a manner that the thin part is bridged between the adjacent thickparts. Therefore, the vibration can be generated from the firstpiezoelectric/electrostrictive element, serving as the vibrationgenerating source, with high output.

(D10) In the above-mentioned configuration D09, the first substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be formed to include a space enclosed by an innersurface of the thin part at the first substrate and a side face of thethick part at the first substrate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the first substrate, and the thin part is formed so as to bebridged between the adjacent thick parts at the outer side of the firstsubstrate. Therefore, a part of the specific space can be formed withinthe range of the thickness of the first substrate. Accordingly, thepassage detection apparatus can be miniaturized.

(D11) In the above-mentioned configuration D10, the side face of thethick part at the first substrate may be configured to be capable ofreflecting sound wave or ultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of theconcave part forming the specific space. Therefore, directivity when theultrasonic wave or the like propagates through the medium is enhanced.Accordingly, the passage of the object and/or the size of the object cansatisfactorily be detected even though the input voltage of the firstpiezoelectric/electrostrictive element, which constitutes the vibrationgenerating source, is reduced to decrease the power consumption.

(D12) In any one of the above-mentioned configurations D03 to D11, thesecond substrate may include a thin part and a thick part, and thesensor unit and the second electrode may be attached to the thin part ofthe second substrate. The thin part is formed into a flat plate shape.The thick part is a member having a flat plate shape thicker than thethin part. The thick part is formed at both sides of the thin part.

According to the configuration described above, the second substrate isformed in such a manner that the thin part is bridged between theadjacent thick parts. Therefore, the thin part can be vibrated with highefficiency by the vibration propagating through the medium. Accordingly,the passage of the object and/or the size of the object can be detectedwith high sensitivity.

(D13) In the above-mentioned configuration D12, the second substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be configured to include a space enclosed by an innersurface of the thin part at the second substrate and a side face of thethick part at the second substrate.

In the configuration described above, a concave part composing thespecific space is formed at the inner side (the side facing the specificspace) of the second substrate, and the thin part is formed so as to bebridged between the adjacent thick parts at the outer side of the secondsubstrate. Therefore, a part of the specific space can be formed withinthe range of the thickness of the second substrate. Accordingly, thepassage detection apparatus can be miniaturized. In particular, nearlyentire specific space can be formed within the range of the thickness,obtained by superimposing the first substrate and the second substrate,by forming the first substrate in the same manner as the secondsubstrate (refer to the configuration D11). Consequently, the passagedetection apparatus can further be miniaturized

(D14) In the above-mentioned configuration D13, the side face of thethick part at the second substrate may be formed to be smooth to anextent of being capable of nearly totally reflecting sound wave orultrasonic wave.

In the configuration described above, sound wave or ultrasonic wave canbe reflected with high efficiency by the inner wall surface of theconcave part composing the specific space. Therefore, directivity whenthe ultrasonic wave or the like propagates through the medium isenhanced. Accordingly, the thin part can be vibrated with highefficiency by the vibration propagating through the medium. Inparticular, it is preferable that the first substrate is formed in thesame manner as the second substrate (refer to the configuration D12).Accordingly, the vibration from the first piezoelectric/electrostrictiveelement to the second piezoelectric/electrostrictive element in thespecific space formed at the inner side of the portion where the firstand the second substrates are superimposed can be propagated with highdirectivity.

(D15) In any one of the above-mentioned configurations D01 to D14, thevibration generating source may be comprised of apiezoelectric/electrostrictive element having a multi-layer structure.

(Configuration E: Sonic+Electrostatic Capacitive SensorType/Electrostatic Microphone-type Vibration Sensor Unit)

The passage detection apparatus having the configuration D02 may beconfigured as follows.

(E01) The second substrate includes a vibration part having a thinplate-like shape and supported so as to be vibrated by the vibrationpropagating through the medium in the specific space from the vibrationgenerating source. The vibration sensor unit includes a first detectionelectrode, a support plate, and a second detection electrode. The firstdetection electrode is provided at the vibration part. The support plateis arranged parallel to the second substrate so as to face the vibrationpart with a predetermined gap at the outside of the specific space. Thesecond detection electrode is formed on the surface, facing thevibration plate, of the support plate, and is arranged parallel to thefirst detection electrode. The first detection electrode is comprised ofthe second electrode, and the determination unit is configured todetermine the passage of the object in the specific space on the basisof the electrostatic capacitance between the first detection electrodeand the second detection electrode. Specifically, in this configuration,the vibration sensor unit has the structure of the electrostaticmicrophone.

In the configuration described above, the propagation state of thevibration of the medium in the specific space toward the vibration platechanges according to the presence of the object or the size of theobject. Therefore, the vibration state of the vibration plate changesaccording to the presence of the object or the size of the object. Bythe change in the vibration state of the vibration plate, the manner ofchanging the electrostatic capacitance (or impedance) of theelectrostatic capacitance of the second virtual capacitor comprised ofthe first detection electrode and the second detection electrodechanges. The determination unit determines the passage of the objectand/or the size of the object by also referring to the change in theelectrostatic capacitance of the second virtual capacitor.

Specifically, for example, the determination unit can determine thepassage of the object in the specific space and/or the size of theobject on the basis of two outputs described below: (1) the change inthe partial voltage of the virtual capacitor C2 in the circuit in whicha capacitor C1 having the predetermined capacitance and the virtualcapacitor C2 are connected in series. (2) the change in the partialvoltage of the virtual capacitor C4 in the circuit in which a capacitorC3 having the predetermined capacitance and the virtual capacitor C4 areconnected in series.

(E02) In the above-mentioned configuration E01, the first electrode maybe supported on an inner surface of the first substrate that is thesurface at the side of the specific space, and the second electrode maybe supported on an inner surface of the second electrode that is thesurface at the side of the specific space.

In the above-mentioned configuration, the first electrode is supportedby the first substrate so as to face the specific space. Further, thesecond electrode is supported by the second substrate so as to face thespecific space. The virtual capacitor C2 is comprised of the firstelectrode, the second electrode, and the medium (air) in the specificspace, wherein the first substrate and the second substrate do notcompose the virtual capacitor C2. Therefore, the passage of the objectand/or the size of the object can be determined with excellentsensitivity by the simplified structure.

(E03) In the above-mentioned configuration E02, a coating layer made ofan insulating material is formed so as to cover the first electrode andthe second electrode. By virtue of this configuration, the passage ofthe object and/or the size of the object are satisfactorily determinedeven when the object is liquid or conductive.

(E04) In the above-mentioned configuration E01, the first electrode maybe formed on an outer surface, which is reverse to an inner surface atthe side of the specific space, of the first substrate, and the secondelectrode may be formed on an outer surface, which is reverse to aninner surface at the side of the specific space, of the secondsubstrate.

In the configuration described above, the first substrate and the secondsubstrate are arranged in such a manner that the inner surfaces of thefirst substrate and the second substrate face the specific space (insuch a manner that the first electrode and the second electrode are notexposed to the specific space). Thus, the passage of the object and/orthe size of the object can satisfactorily be determined, even when theobject is liquid or conductive. It is to be noted that the innersurfaces of the first substrate and the second substrate may be exposedto the specific space, or a coating layer made of an insulating materialmay be formed on the inner surfaces.

(E05) In the above-mentioned configuration E05, the first substrate andthe second substrate may be arranged such that the distance L betweenthe inner surface of the first substrate and the inner surface of thesecond substrate satisfies the equation of L=nλ or L=(m/2)·λ, whereinthe wavelength of the vibration propagating through the medium isdefined as λ, and n and m are defined as a natural number. Accordingly,the vibration can more efficiently be propagated, so that the passage ofthe object and/or the size of the object can be detected with enhancedsensitivity.

(E06) The passage detection apparatus having any one of theabove-mentioned configurations E01 to E05 may be configured as follows.The vibration generating source is comprised of a firstpiezoelectric/electrostrictive element having a first dielectric layer,a drive electrode and a first reference electrode. The drive electrodeand the first reference electrode are formed at both sides of the firstdielectric layer. The first electrode is comprised of the firstreference electrode or the drive electrode.

According to this configuration, the passage detection apparatusaccording to the present invention having the structure in which thestructure of the electrostatic capacitive sensor and the structure ofthe sonic (ultrasonic) sensor are combined can be provided with asimplified structure.

(E07) In the above-mentioned configuration E06, the first substrate, thefirst piezoelectric/electrostrictive element, and the first electrodemay be integrally formed by sintering. Accordingly, the fixing forcebetween the first substrate and the first electrode as well as the firstpiezoelectric/electrostrictive element is enhanced. Consequently, apassage detection apparatus having high durability can be obtained by asimple manufacturing process.

(E08) In any one of the above-mentioned configurations E01 to E07, thefirst substrate may include a thin part and a thick part, and thevibration generating source and the first electrode may be attached tothe thin part of the first substrate. The thin part is formed into aflat plate shape. The thick part is a member having a flat plate shapethicker than the thin part. The thick part is formed at both sides ofthe thin part.

(E09) In the above-mentioned configuration E08, the first substrate maybe formed such that an outer surface of the thin part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be configured to include a space enclosed by an innersurface of the thin part at the first substrate and a side face of thethick part at the first substrate.

(E10) In the above-mentioned configuration E09, the side face of thethick part at the first substrate may be formed so as to be capable ofreflecting sound wave or ultrasonic wave.

(E11) In any one of the above-mentioned configurations E01 to E10, thesecond substrate may have a plate-like thick part that is thicker thanthe vibration part. The thick part is formed at both sides of thevibration part. According to the configuration described above, thevibration part is arranged so as to be bridged between the thick parts,whereby the vibration part is efficiently vibrated.

(E12) In the above-mentioned configuration E11, the second substrate maybe formed such that an outer surface of the vibration part and an outersurface of the thick part are continuous on a same plane, and thespecific space may be configured to include a space enclosed by an innersurface of the vibration part at the second substrate and a side face ofthe thick part at the second substrate.

(E13) In the above-mentioned configuration E12, the side face of thethick part at the second substrate may be formed to be smooth to anextent of being capable of nearly totally reflecting sound wave orultrasonic wave.

(E14) In any one of the above-mentioned configurations E01 to E13, thevibration generating source may be comprised of apiezoelectric/electrostrictive element having a multi-layer structure.

(F01) In the configurations A01 to A16, B01 to B13, D01 to D16, and E01to E14, it is preferable that the resonance frequency of the vibrationgenerating source is set so as to be generally equal to the resonancefrequency of the sensor unit. By virtue of this configuration, thepassage of the object and/or the size of the object can be detected withenhanced sensitivity at the sensor unit having the structure of thesonic (ultrasonic) sensor.

(F02) In the above-mentioned configuration F01, drive means for drivingthe vibration generating source may be further provided, wherein thedrive means may be configured to drive the vibration generating sourceby outputting, to the vibration generating source, a pulse signal havinga cycle corresponding to the resonance frequency of the vibrationgenerating source. With this configuration, the vibration can begenerated with high efficiency at the vibration generating source havingthe structure of the sonic (ultrasonic) sensor.

(F03) In the above-mentioned configuration F02, the drive means may beconfigured to output the pulse signal in synchronism with the passagetiming of the object. With this configuration, the passage of the objectand/or the size of the object can surely be detected.

(F04) In any one of the above-mentioned configurations F01 to F03, thesensor unit may be configured to output a voltage according to thepropagation state of the vibration from the vibration generating source,and the determination unit may be configured to detect the passage ofthe object in the specific space on the basis of the change in theoutput voltage of the sensor unit. With this configuration, the passageof the object and/or the size of the object can be detected withenhanced sensitivity at the sensor unit having the structure of thesonic (ultrasonic) sensor.

(G01) In each of the above-mentioned configurations, an aperture platethat is a plate-like member having formed thereto an aperture, which isa through-hole through which the object can pass, may be furtherprovided. The aperture plate is arranged at the end portion of thespecific space at the inlet side of the object so as to cross thepassage direction of the object. The aperture is formed to be smallerthan the size of the specific space in the section perpendicular to thepassage direction of the object.

According to the configuration described above, the flight state (e.g.,advancing direction or rectilinearity) in the specific space can bedetected with simplified structure by appropriately setting thepositional relationship between the opening at the end portion of thespecific space at the side of the inlet of the object and the aperture.

(G02) The passage detection apparatus having any one of theabove-mentioned configurations may have a shield member. The shieldmember includes an element noise reducing shield member and/or a circuitnoise reducing shield member.

The element noise reducing shield member is provided such that theelement portions for the transmission and reception are made opposite toeach other and the portions other than the element portions are coveredin all directions in the sensor unit and/or the vibration generatingsource. The circuit noise reducing shield member is configured such thatthe determination unit is covered, whereby the electrical noise appliedto the determination unit is eliminated.

In the configuration described above, the electrical noise is eliminatedby the shield member. Thus, the S/N ratio in the passage detection ofthe object is enhanced. Accordingly, more micro object can be detectedwith high precision.

(G03) The passage detection apparatus having any one of theabove-mentioned configurations may have a band pass filter. The bandpass filter can be interposed between the sensor unit and thedetermination unit. Alternatively, the band pass filter can be providedat the determination unit. The band pass filter is configured to limitthe frequency of the output from the sensor unit to the band around thedesired resonance frequency (specifically, within the range of ±10% ofthe desired resonance frequency, for example).

In the configuration described above, a mechanical noise is eliminatedthat is based upon ambient sound wave or the vibration or the like of anunnecessary mode other than the vibration of the desired modecorresponding to the desired resonant frequency. Accordingly, the S/Nratio for the detection of the passage of the object is enhanced.Consequently, an object having more micro size can be detected with highprecision.

(G04) In each of the above-mentioned configurations, the vibrationgenerating source and the sensor unit may be configured such that theresonance frequency of the vibration generating source and the resonancefrequency of the sensor unit are generally equal to each other in afirst vibration mode, and the resonance frequency of the vibrationgenerating source and the resonance frequency of the sensor unit aredifferent from each other in a second vibration mode that is differentfrom the first vibration mode. Specifically, the vibration generatingsource may have the structure different from that of the sensor unit.

In the configuration described above, the output from the sensor unitbased upon the vibration of the sensor unit other than the firstvibration mode in the vibration generating source can be suppressed.Accordingly, the SIN ratio for the detection of the passage of theobject is enhanced. Consequently, an object having more micro size canbe detected with high precision.

BRIEF DESCRIPTION OF THE DRAWINGS

Various other objects, features and many of the attendant advantages ofthe present invention will be readily appreciated as the same becomesbetter understood by reference to the following detailed description ofthe preferred embodiment when considered in connection with theaccompanying drawings, in which:

FIG. 1 is an external view (perspective view) illustrating the generalstructure of a DNA chip;

FIG. 2 is an enlarged sectional view of the DNA chip shown in FIG. 1;

FIG. 3 is an enlarged sectional view of a micropipette;

FIG. 4 is an enlarged and see-through perspective view illustrating thestructure of a sample solution flow channel in the micropipette shown inFIG. 3;

FIG. 5 is an enlarged plan view of the micropipette shown in FIG. 3;

FIG. 6A is a plan view showing a general structure of a dispensingapparatus having the micropipette shown in FIG. 3;

FIG. 6B is a side view of the dispensing apparatus;

FIG. 7 is an exploded perspective view of the dispensing apparatus shownin FIG. 6:

FIG. 8 is a side view illustrating a passage detection apparatusaccording one embodiment of the present invention, which is mounted inthe dispensing apparatus shown in FIG. 6;

FIG. 9 is an enlarged perspective view showing the passage detectionapparatus shown in FIG. 8;

FIG. 10A is an enlarged sectional view showing the structure of a firstembodiment of the passage detection apparatus shown in FIG. 9;

FIG. 10B is an enlarged sectional view showing the structure of amodification of the passage detection apparatus shown in FIG. 10A;

FIG. 11 is a block diagram schematically showing an electric circuitconfiguration applied to the passage detection apparatus according tothe embodiment shown in FIGS. 10A and 10B;

FIG. 12 is a signal chart showing the state of a drive control of thedispensing apparatus and the state of the detection of the passage ofthe object at the determination/control unit shown in FIG. 11;

FIG. 13 is an enlarged sectional view showing the second embodiment ofthe passage detection apparatus shown in FIG. 9;

FIG. 14 is an enlarged sectional view showing the third embodiment ofthe passage detection apparatus shown in FIG. 9;

FIG. 15A is an enlarged sectional view showing the fourth embodiment ofpassage detection apparatus shown in FIG. 9;

FIG. 15B is an enlarged sectional view showing the structure accordingto the modification of the passage detection apparatus shown in FIG.15A:

FIG. 16 is a block diagram schematically showing the electric circuitconfiguration applied to the passage detection apparatus according tothe fourth embodiment shown in FIG. 15;

FIG. 17 is an enlarged sectional view showing the fifth embodiment ofthe passage detection apparatus shown in FIG. 9;

FIG. 18 is an enlarged sectional view showing the modification of thedetection unit, serving as the vibration transmitting source, in thepassage detection apparatus shown in FIG. 10 to FIG. 17;

FIG. 19 is an enlarged sectional view showing an example of thestructure of the passage detection apparatus using the detection unit,serving as the vibration transmitting source, shown in FIG. 18;

FIG. 20 is an enlarged sectional view showing the modification of thefirst substrate shown in FIG. 9;

FIG. 21 is an enlarged sectional view showing the modification of thesecond substrate shown in FIG. 9;

FIG. 22 is an enlarged sectional view showing an example of thestructure of the passage detection apparatus having the first substrateshown in FIG. 21 and the second substrate shown in FIG. 22;

FIGS. 23A and 23B are enlarged sectional views showing othermodifications of the detection unit, serving as the vibrationtransmitting source, shown in FIGS. 10 to 22;

FIGS. 23C and 23D are enlarged sectional views showing othermodifications of the detection unit at the reception side shown in FIGS.10 to 22; and

FIG. 24 is an enlarged perspective view showing another modification ofthe passage detection apparatus shown in FIG. 9; and

FIG. 25 is a block diagram showing the modification of an electriccircuit configuration applied to the passage detection apparatusaccording to the embodiments shown in FIGS. 11 to 16.

DESCRIPTION OF THE PREFERRED EMBODIMENT

Now, a preferred embodiment (embodiment that the applicant of thepresent application considers as the best mode upon filing the presentapplication) of the present invention will be described in detail withreference to the accompanying drawings.

<Construction of DNA Chips>

FIG. 1 is an external view (a perspective view) illustrating the generalstructure of a DNA chip 10, and FIG. 2 is an enlarged sectional view ofthe DNA chip shown in FIG. 1.

As shown in FIG. 1, the DNA chip 10 is constructed by arranging pluralmicro spots S, which are formed by micro drops of a sample solution, ona DNA chip substrate 12, which is made of microscope slide glass.

As shown in FIG. 2, a protrusion 12 a is formed on the DNA chip 12 at apredetermined position where the corresponding micro spot S is to beformed. When the corresponding micro spot S drops while deviating fromthe predetermined position, the protrusion 12 a serves to compensate forthe positional deviation. Specifically, when a portion of the micro spotS is caught by the protrusion 12 a (see a two-dot chain line), as shownin FIG. 2, the micro spot S is moved to the predetermined position bythe surface tension of the micro spot S.

Also, a sample support layer 14, which is a poly-L-lysine layer having ahydrophilic property, is formed on the surface of the DNA chip substrate12.

<Structure of Micropipette>

Hereinafter, the structure of a micropipette, which is used tomanufacture the above-described DNA chip 10, will be described indetail.

FIG. 3 is an enlarged sectional view of the micropipette 100, FIG. 4 isa see-through perspective view illustrating the construction of a flowchannel for a sample solution in the micropipette 100, and FIG. 5 is aplan view of the micropipette 100.

Referring to FIG. 3, the micropipette 100 includes a nozzle plate 110, acavity unit 120 fixed to the upper surface of the nozzle plate 110, andan actuator unit 130 fixed to the upper surface of the cavity unit 120.In the nozzle plate 110 is formed a through-hole, i.e., a nozzle 112,through which the sample solution passes.

The nozzle plate 110 is formed from a thin ceramic plate. The materialof the nozzle plate 110 includes, for example, zirconium oxide, aluminumoxide, magnesium oxide, aluminum nitride, and silicon nitride. Mostpreferably, a material mainly containing fully stabilized zirconiumoxide or a material mainly containing partially stabilized zirconiumoxide is used in terms of mechanical strength and a reaction to thematerial of a piezoelectric/electrostrictive film or an electrode film.

The cavity unit 120 includes a connection plate 121, a flow channelplate 122, an orifice plate 123, a cavity plate 124, and an injectionport plate 125. The connection plate 121, the flow channel plate 122,the orifice plate 123, the cavity plate 124, and the injection portplate 125 are formed from a thin ceramic plate. The connection plate121, the flow channel plate 122, the orifice plate 123, the cavity plate124, the injection port plate 125, and the nozzle plate 110 are sinteredwhile they are stacked in order on the nozzle plate 110. As a result,they are integrally formed at the nozzle plate 110.

The connection plate 121 is disposed at the connection between thecavity plate 120 and the nozzle plate 110 such that the connection plate121 is joined to the upper surface of the nozzle plate 110. In theconnection plate 121 is formed a through-hole having the same diameteras the nozzle 112, i.e., a nozzle communication hole 121 a. The nozzlecommunication hole 121 a is connected to a cavity 124 a formed in thecavity plate 124 via a sample outlet hole 126. The sample outlet hole126 is a through-hole having a diameter greater than that of the nozzlecommunication hole 121 a. The sample outlet hole 126 is formed throughthe flow channel plate 122 and the orifice plate 123.

In the flow channel plate 122 is formed a sample supply channel 122 a,through which the sample solution is supplied to the cavity 124 a. Thesample supply channel 122 a and the cavity 124 a are connected with eachother via an orifice 123 a, which is a through-hole, having a smalldiameter, formed in the orifice plate 123.

The injection port plate 125 is disposed at the uppermost layer of thecavity unit 120. In the injection port plate 125 is formed a sampleinjection port 125 a, which is a through-hole for allowing the samplesolution to be injected toward the sample supply channel 122 a formed inthe flow channel plate 122. The sample injection port 125 a and thesample supply channel 122 a formed in the flow channel plate 122 areconnected with each other via a sample introduction hole 127, which is athrough-hole. The sample introduction hole 127 is formed through theorifice plate 123 and the cavity plate 124.

As shown in FIG. 4, a sample solution flow channel is formed in thecavity unit 120 with the above-stated construction such that the samplesolution flow channel extends from the sample injection port 125 a tothe nozzle 112. Specifically, the dimension of the orifice 123 a is setsuch that, when the cavity 124 a is pressurized, the sample solution inthe cavity 124 a does not flow backward to the sample supply channel 122a through the small-diameter orifice 123 a but flows out toward thenozzle 112 through the sample outlet hole 126, and therefore, microdrops of the sample solution are ejected to the outside from the nozzle112.

Referring back to FIG. 3, the actuator unit 130 includes apiezoelectric/electrostrictive layer 131, a lower electrode 132 fixed tothe lower surface of the piezoelectric/electrostrictive layer 131, andan upper electrode 133 fixed to the upper surface of thepiezoelectric/electrostrictive layer 131. Thepiezoelectric/electrostrictive layer 131 is disposed at a predeterminedposition corresponding to the cavity 124 a (i.e., right above the cavity124 a). The lower electrode 132 is fixed to the upper surface of theinjection port plate 125, and therefore, the actuator unit 130 is fixedto the upper surface of the cavity unit 120. The actuator unit 130 isconstructed such that the actuator unit 130 changes the interior volumeof the cavity 124 a, when drive voltage is applied between the lowerelectrode 132 and the upper electrode 133, to eject a predeterminedamount of the sample solution from the nozzle 112.

The lower electrode 132 is connected to a lower electrode wiring pattern132 a, which is a conductive film formed at the upper surface of theinjection port plate 125. The upper electrode 133 is connected to anupper electrode wiring pattern 133 a, which is a conductive film formedat the upper surface of the injection port plate 125.

As shown in FIG. 5, a lower electrode input terminal 141 is formed atthe upper surface of the injection port plate 125. The lower electrodeinput terminal 141 is connected to the lower electrode wiring pattern132 a. Also, an upper electrode input terminal 142 is formed at theupper surface of the injection port plate 125. The upper electrode inputterminal 142 is connected to the upper electrode wiring pattern 133 a.The lower electrode input terminal 141 and the upper electrode inputterminal 142 are connected to an external device that drives theactuator unit 130. Consequently, the actuator unit 130 is driven bydrive voltage applied between the lower electrode input terminal 141 andthe upper electrode input terminal 142 via the external device.

<Structure of Dispensing Apparatus>

Next, a dispensing apparatus 200 having the micropipette 100 with theabove-stated structure will be described in detail. FIGS. 6A and 6Billustrate the structure of the dispensing apparatus 200. Specifically,FIG. 6A is a plan view of the dispensing apparatus 200, and FIG. 6B is aside view of the dispensing apparatus 200. FIG. 7 is an explodedperspective view of the dispensing apparatus 200.

As shown in FIG. 6A, the dispensing apparatus 200 includes a plurality(10 in the drawing) of micropipettes 100 arranged in two dimensions. Allthe micropipettes 100 have a common nozzle plate 110, the constructionof which has already been described above. The common nozzle plate 110is a ceramic plate.

The dispensing apparatus 200 includes sample introduction members 210for introducing the sample solution to the respective sample injectionports 125 a of the micropipettes 100 (see FIG. 5). As shown in FIGS. 6Aand 6B, the sample introduction members 210 are connected to the uppersurfaces of the micropipettes 110 arranged in the two dimensions. Asshown in FIG. 7, the sample introduction members 210 are fixed to theupper surface of the nozzle plate 110 by means of threaded holes 114formed in the nozzle plate 110 and fixing bolts 212.

Referring to FIG. 6B, sample injection channels 214, which areconstructed in the shape of a through-hole, are formed in each sampleintroduction member 210. The openings at the lower ends of the sampleinjection channels 214 are connected to the corresponding sampleinjection ports 125 a of the micropipettes 100 (see FIG. 5). Also, theopenings at the upper ends of the sample injection channels 214 areconnected to the lower ends of introduction tubes 216, which areconstructed in the shape of a trumpet whose diameter gradually increasesupward.

Referring to FIG. 7, the plural introduction tubes 216 arranged in twodimensions are disposed and constructed such that the introduction tubes216 are coupled with plural sample storage portions 222, which areformed at a cartridge 220 that stores a sample solution, while thesample storage portions 222 protrude downward from the cartridge 220.The cartridge 220 is formed by injection molding of a soft syntheticresin. The cartridge 220 is constructed such that openings are formed atthe bottoms of the sample storage portions 222 using a needle, andtherefore, the sample solution stored in the sample storage portions 222is introduced into the introduction tubes 216, whereby different kindsof sample solutions are supplied to the respective sample injectionports 125 a.

Structure of Passage Detection Apparatus according to a PreferredEmbodiment

Next, the general structure of a passage detection apparatus accordingto a preferred embodiment of the present invention will be described indetail. FIG. 8 is a side view illustrating a passage detection apparatus300 according to the present embodiment mounted between the nozzle plate110, having sample solution ejection ports, of the dispensing apparatus200 and the DNA chip substrate 12 constituting the DNA chip 10 (see FIG.1). FIG. 9 is an enlarged perspective view of the passage detectionapparatus 300 according to the present embodiment.

Referring to FIG. 8, the passage detection apparatus 300 is configuredas described below so as to be capable of detecting whether or not thesample solution is properly ejected to the DNA chip substrate 12 fromeach micropipette 100 at the dispensing apparatus 200.

Referring to FIG. 9, the passage detection apparatus 300 has a pair ofdetection units 310 and 320. The detection unit 310 is supported by afirst substrate 330 that is vertical to the DNA chip substrate 12. Asignal line 310 a is electrically connected to the detection unit 310for transmitting or receiving signals between the detection unit 310 andthe above-mentioned external device (control device provided with a CPU,etc.). The detection unit 320 is supported by a second substrate 340that is parallel to the first substrate 330, and arranged at theposition corresponding to the detection unit 310 supported by the firstsubstrate 330. A signal lien 320 a is electrically connected to thedetection unit 320 for transmitting or receiving signals between thedetection unit 320 and the above-mentioned external device.

A pair of detection units 310 and 320 is configured to receive the inputof the signal from the external device through the signal lines 310 aand/or 320 a, and to output the signal to the external device throughthe signal lines 310 a and/or 320 a according to the state (thepropagation state of ultrasonic wave or dielectric constant) in thespace formed between both of them. Examples applicable to the detectionunits 310 and 320 include a pair of plate electrodes that can form avirtual capacitor for detecting the change in the dielectric constant, apiezoelectric/electrostrictive element that can generate a vibrationaccording to the inputted signal and generate an output signal accordingto the inputted vibration, or the like. The detection units 310 and 320may include a power supply, pulse generating source, etc. that suppliesa predetermined DC voltage or a pulse voltage to the virtual capacitoror the piezoelectric/electrostrictive element.

An aperture plate having a thin plate-like shape is attached at theupper ends of the first substrate 330 and the second substrate 340. Theaperture plate 350 is formed with an aperture 351, which is athrough-hole through which micro drops of the sample solution ejectedfrom the micropipette 100 (see FIG. 8) can pass. Plural apertures 351are arranged and formed so as to correspond to the arrangement in twodimensions (see FIGS. 6 and 7) of the plural micropipettes 100 describedabove. The aperture 351 is formed in such a manner that the center ofthe aperture 351 viewed in a plane is positioned between the pair ofopposite detection units 310 and 320 and positioned on the straight linelinking the center of the detection unit 310 and the center of thedetection unit 320. Specifically, the aperture 351 is formed such that,when the flight direction of the micro drop of the sample solutioncoincides with the predetermined direction (the direction of D in thefigure), the micro drop passes through the aperture 351 and fliesimmediately below the aperture 351.

The space enclosed by the inner surface 330 a, which is the surfacefacing the second substrate 340, of the first substrate 330 and theinner surface 340 a, which the surface facing the first substrate 330,of the second substrate 340, which space is below the aperture plate350, forms the specific space 300 a through which the micro drops of thesample solution pass.

The signal line 310 a connected to the detection unit 310 is arranged atthe outside of the outer surface 330 b, which is the surface reverse tothe inner surface 330 a, of the first substrate 330. Similarly, thesignal line 320 a connected to the detection unit 320 is arranged at theoutside of the outer surface 340 b, which is the surface reverse to theinner surface 340 a, of the second substrate 340.

As described above, the passage detection apparatus 300 according to thepresent embodiment is configured to detect the change in the state(electrostatic capacitance and/or propagation state of ultrasonic wave),caused by the passage of the micro drops of the sample solution, in thespecific space 300 a by the detection units 310 and 320 arranged so asto enclose the specific space 300 a, and to output the detected resultthrough the signal lines 310 a and/or 320 a.

The passage detection apparatus 300 according to the present embodimentis configured such that the detection unit 310 faces the inner surface330 a of the first substrate 330, and the detection unit 320 faces theinner surface 340 a of the second substrate 340. Specifically, when thevolume of the micro drop is extremely small (e.g., picoliter order), forexample, the detection units 310 and 320 are arranged so as to face thespecific space 300 a in order to detect the passage of the micro drop orthe size (volume) thereof with high sensitivity.

Alternatively, the passage detection apparatus 300 is configured suchthat the detection unit 310 is exposed to the outer surface 330 b of thefirst substrate 330 and the detection unit 320 is exposed to the outersurface 340 b of the second substrate 340. Specifically, when the microdrop has conductivity, the detection units 310 and 320 are arranged atthe outside of the specific space 300 a in order that fault(short-circuit between the electrodes or corrosion) is not generated onthe detection units 310 and 320 due to the deposition of the micro drop.

Further, the passage detection apparatus according to the presentembodiment can be configured such that the detection unit 310 is exposedto the outer surface 330 b of the first substrate 330 and the detectionunit 320 is exposed to the inner surface 340 a of the second substrate340.

Moreover, the passage detection apparatus according to the presentembodiment can be configured such that the detection unit 310 is exposedto the inner surface 330 a of the first substrate 330 and the detectionunit 320 is exposed to the outer surface 340 b of the second substrate340.

The arrangement relationship between the detection units 310 and 320 andthe first and second substrates 330 and 340 can appropriately beselected according to the property of the micro drop (physicalproperties such as volume, weight, electrical conductivity, chargingamount, etc.; chemical properties such as pH, corrosivity; moving speed;ejection cycle, etc.), the width of the specific space 300 a (thedistance between the inner surface 330 a of the first substrate 330 andthe inner surface 340 a of the second substrate 340), the structures ofthe detection units 310 and 320, and the like.

Embodiments of Structure of Detection Unit

Next, the detail of the specific structure of the passage detectionapparatus 300, i.e., the embodiments of the structure of the detectionunits 310 and 320 will be explained below.

Embodiment 1

FIGS. 10A and 10B are enlarged sectional views showing a firstembodiment of the structure of the detection units 310 and 320. In thisembodiment, the detection units 310 and 320 are comprised of apiezoelectric/electrostrictive element.

Specifically, a first piezoelectric/electrostrictive element 313constituting the detection unit 310 is comprised of a first dielectriclayer 313 a, a drive electrode 313 b, and a first reference electrode313 c. The first dielectric layer 313 a is formed from a thin plate of apiezoelectric/electrostrictive material (PZT, or the like) showing apiezoelectric effect and inverse piezoelectric effect. The driveelectrode 313 b and the first reference electrode 313 c are made of ametallic film formed at both surfaces of the first dielectric layer 313a. The first piezoelectric/electrostrictive element 313 is formedintegral with the first substrate 330 in such a manner that the coatinglayer, which is the base of the first dielectric layer 313 a, the driveelectrode 313 b, and the first reference electrode 313 c, is formed onthe first substrate 330, and then sintered.

A second piezoelectric/electrostrictive element 323 constituting thedetection unit 320 is comprised of a second dielectric layer 323 a, asignal output electrode 323 b, and a second reference electrode 323 c.The second piezoelectric/electrostrictive element 323 has the structuresame as that of the first piezoelectric/electrostrictive element, and isalso formed integral with the second substrate 340.

An output terminal of a high voltage of a pulse generating source 314that generates a pulse signal is connected to the drive electrode 313 bof the first piezoelectric/electrostrictive element 313. The firstreference electrode 313 c is grounded. The firstpiezoelectric/electrostrictive element 313 is configured to produce avibration by applying a voltage in the form of a pulse between the driveelectrode 313 b and the first reference electrode 313 c from the pulsegenerating source 314. Specifically, the firstpiezoelectric/electrostrictive element 313 functions as a vibrationgenerating source. The detection unit 310 is configured such thatultrasonic wave is propagated to the medium (air) in the specific space300 a by the vibration of the first piezoelectric/electrostrictiveelement 313.

The second piezoelectric/electrostrictive element 323 is configured togenerate a voltage between the signal output electrode 323 b and thesecond reference electrode 323 c according to stress externally applied.A voltmeter 312 is connected to the secondpiezoelectric/electrostrictive element 323 for acquiring the voltagebetween the signal output electrode 323 b and the second referenceelectrode 323 c. The second reference electrode 323 c is grounded. Thesecond piezoelectric/electrostrictive element 323 is configured suchthat the second substrate 340 is vibrated due to the propagation of theultrasonic wave to the second substrate 340 through the medium (air) inthe specific space 300 a, and the voltage is generated at both ends ofthe voltmeter 312 according to the stress applied to the secondpiezoelectric/electrostrictive element 323 by the vibration of thesecond substrate 340. Specifically, the secondpiezoelectric/electrostrictive element 320 constituting the detectionunit 320 is configured as a sensor unit that can generate an outputaccording to the vibration propagating through the medium in thespecific space 300 a from the first piezoelectric/electrostrictiveelement 313 (vibration generating source).

As described above, the passage detection apparatus according to thepresent embodiment is configured to detect the change in the propagationstate of the ultrasonic wave in the specific space 300 a on the basis ofthe change in the voltage at both ends of the voltmeter 312 so as todetermine whether the micro drop of the sample solution passes throughthe specific space 300 a or not or the volume of the micro drop.

In the present embodiment, the first piezoelectric/electrostrictiveelement 313 and the second piezoelectric/electrostrictive element 323are arranged so as to form the specific space 300 a between the firstreference electrode 313 c and the second reference electrode 323 c.Specifically, the first piezoelectric/electrostrictive element 313 isarranged in such a manner that the first reference electrode 313 c iscloser to the specific space 300 a compared to the drive electrode 313b. The second piezoelectric/electrostrictive element 323 is arranged insuch a manner that the second reference electrode 323 c is closer to thespecific space 300 a compared to the signal output electrode 323 b.

As described above, the specific space 300 a is arranged so as to besandwiched between the grounded first reference electrode 313 c and thegrounded second reference electrode 323 c in the passage detectionapparatus 300 according to the present embodiment. Specifically, thepassage detection apparatus 300 is configured to prevent the generationof the electric field in the specific space 300 a, whereby it isprevented that the flight route of the micro drop is curved due to theelectric field, when the micro drop of the sample solution iselectrostatically charged.

The width L of the specific space 300 a is set to satisfy the followingequation, supposing that the wavelength of the vibration propagatingthrough the medium (air, etc.) in the specific space 300 a is X, and nis a natural number.

L=nλ

In the structure shown in FIG. 10A, the firstpiezoelectric/electrostrictive element 313 is formed on the innersurface 330 a of the first substrate 330. The secondpiezoelectric/electrostrictive element 323 is formed on the innersurface 340 a of the second substrate 340. Specifically, the firstpiezoelectric/electrostrictive element 313 and the secondpiezoelectric/electrostrictive element 323 are arranged to face thespecific space 300 a.

In the structure shown in FIG. 10B, the firstpiezoelectric/electrostrictive element 313 is provided on the outersurface 330 b of the first substrate 330. The secondpiezoelectric/electrostrictive element 323 is provided on the outersurface 340 b of the second substrate 340. Specifically, the firstpiezoelectric/electrostrictive element 313 and the secondpiezoelectric/electrostrictive element 323 are arranged at the outsideof the specific space 300 a (so as not to be exposed to the specificspace 300 a).

<Circuit Configuration for Determination of Passage of Object>

Next, the circuit configuration for determining the ejection state ofthe micro drop of the sample solution from the micropipette 100 (seeFIG. 8) by using the structure in the first embodiment will be explainedwith reference to FIG. 11.

A determination/control section 360 includes a CPU, etc. for controllingthe overall operation of the present apparatus. Thedetermination/control section 360 is connected to the detection unit320, drive voltage applying section 370, and actuator driver 380.

The drive voltage applying section 370 includes the pulse generatingsource 314 shown in FIGS. 10A and 10B for applying a drive voltage tothe detection unit 310 (the first piezoelectric/electrostrictive element313 in FIGS. 10A and 10B). The determination/control section 360controls the drive voltage applying section 370, thereby applying adrive voltage having an arbitrary waveform to the detection unit 310.

The determination/control section 360 is connected to the detection unit320 (the second piezoelectric/electrostrictive element 323 in FIGS. 10Aand 10B) for receiving an output signal from the detection unit 320.Specifically, the determination/control section 360 is configured toinclude the voltmeter 312 in FIGS. 10A and 10B. Thedetermination/control section 360 receives an output generated from thedetection unit 320 and determines the ejecting state of the micro dropof the sample solution on the basis of the output.

The actuator driver 380 is connected to the lower electrode inputterminal 141 and the upper electrode input terminal (see FIG. 5) in theactuator unit 130. The determination/control section 360 is configuredto control the drive (i.e., the ejection of the micro drop of the samplesolution) of the actuator unit 130 through the actuator driver 380.

Description of Operation of Apparatus According to Embodiment

Next, the operation of the apparatus with the above-mentioned structureaccording to the embodiment will be described with reference to thedrawings.

<<Manufacturing Process of DNA Chip>>

First, the manufacturing process of the DNA chip 10 shown in FIG. 1 willbe described. The manufacturing process includes a pre-treatment processof forming a sample support layer 14 (see FIG. 2), which is apoly-L-lysine layer, on the surface of the DNA chip substrate 12, asample manufacturing process of manufacturing a sample solutioncontaining DNA pieces, and a supply process of supplying themanufactured sample solution onto the DNA chip substrate 12.

The pre-treatment process is carried out as follows. First, the DNA chipsubstrate 12 is soaked in a predetermined alkali solution at the roomtemperature for at least two hours. As the alkali solution, for example,there may be used a solution obtained by dissolving NaOH in distilledwater, adding ethanol in the mixture, and stirring the mixture until themixture becomes fully transparent. After that, the DNA chip substrate 12is taken out of the alkali solution, and is then washed in distilledwater. Subsequently, the DNA chip substrate 12 is soaked in apoly-L-lysine solution manufactured by adding poly-L-lysine in distilledwater for approximately one hour. After that, the DNA chip substrate 12is taken out of the poly-L-lysine solution, and the poly-L-lysinesolution remaining on the DNA chip substrate 12 is removed bycentrifugal separation. Subsequently, the DNA chip substrate 12 is driedat 40° C. for approximately 5 minutes. In this way, a DNA chip substrate12 having the poly-L-lysine sample support layer 14 formed on thesurface thereof is obtained.

The sample manufacturing process includes an amplifying process ofamplifying the base sequence of the DNA pieces, using polymerase chainreaction (PCR), to obtain a PCR product, a powder producing process ofdrying the obtained PCR product to obtain DNA powder, and a mixingprocess of dissolving the obtained DNA powder in a buffer solution. Inthe powder producing process, first, sodium acetate of 3M (=3 mol/l) andisopropanol are added to the PCR product, and the mixture is left for afew hours. After that, the solution is centrifugally separated, andtherefore, the DNA pieces are precipitated. The precipitated DNA piecesare rinsed using ethanol, are centrifugally separated, and are thendried. As a result, DNA powder is produced. In the mixing process, aTris-EDTA (TE) buffer solution is added to the DNA powder, and themixture is left for a few hours until the DNA powder is fully dissolvedin the buffer solution. As a result, a sample solution is prepared. Theconcentration of the sample solution prepared at this step is 1 to 10μg/μl.

The sample solution obtained as described above is stored in the samplestorage portions 222 of the cartridge 220 shown in FIG. 7. Since thecartridge 220 is mounted to the dispensing apparatus 200 shown in FIG.6, the sample solution is supplied into the respective micropipettes 100in the dispensing apparatus 200. And the micro drops of the samplesolution are ejected toward the DNA chip substrate 12 (see FIG. 1) fromthe respective micropipettes 100, and therefore, the micro drops of thesample solution are supplied onto the DNA chip substrate 12. As aresult, plural micro spots S of the sample solution are formed on theDNA chip substrate 12 in a predetermined array. In this way, the DNAchip 10 is manufactured.

Here, it is difficult to observe the micro drops of the sample solutionwith the naked eye. For this reason, the determination as to whether ornot the micro drops of the sample solution are properly formed on theDNA chip substrate 12 in the predetermined array (whether the ejectingoperation is not correctly carried out, for example, the micro drops arenot ejected, in one or more specific micropipettes 100) cannot beperformed with the naked eye. On the other hand, it is possible todetermine whether the micro drops are not ejected by scanning theejection route of the micro drops with a laser beam. However, theconstruction of an apparatus for determining whether the ejectingoperation is not correctly carried out in the respective micropipettes100 by scanning the laser beam as described above is very expensive.

On the contrary, the determination as to whether the ejecting operationis not correctly carried out in the respective micropipettes 100 of thedispensing apparatus 200 is accomplished using the passage detectionapparatus 300 according to the preferred embodiment of the presentinvention as shown in FIG. 8. As described above, the structure of thepassage detection apparatus 300 is very simple, and therefore, themanufacturing costs of the passage detection apparatus 300 are very low.Although the structure of the passage detection apparatus 300 is verysimple as described above, it is possible for the passage detectionapparatus 300 to accurately perform the determination as to whether theejecting operation is not correctly carried out.

Description of Object Passage Determination Operation AccordingEmbodiment

Next, the determining operation of the ejection state of the micro dropsof the sample solution in the micropipettes 100 using the passagedetection apparatus 300 according to this embodiment will be describedin detail with reference to the drawings.

As shown in FIG. 8, the passage detection apparatus 300 is disposedbelow the nozzle plate 110 of the micropipettes 100. Specifically, thepassage detection apparatus 300 is arranged at the lower part of thedispensing apparatus 200 such that the nozzle plate 110 faces theaperture plate 350 (see FIG. 9) of the passage detection apparatus 300.The dispensing apparatus 200 is driven by an external device.Specifically, the actuator unit 130 (see FIG. 5) of each micropipette100 mounted to the dispensing apparatus 200 is driven. Accordingly,micro drops of the sample solution are ejected from the respectivemicropipettes 100.

Here, the passage detection apparatus 300 is arranged in such a mannerthat the nozzle 112 (see FIG. 3) and the aperture 351 (see FIG. 9) arearranged on a straight line parallel to the flight direction D (see FIG.9) of the micro drop from the nozzle 112. By virtue of thisconfiguration, when the ejecting direction is not appropriate (theejecting direction is not parallel to the predetermined flight directionD shown in FIG. 9) even if the micro drops are ejected from themicropipettes 100, the micro drops collide with the aperture plate 350so as not to pass through the aperture 351.

Referring to FIG. 9, when the micro drops are ejected parallel to thepredetermined flight direction D, the micro drops pass the aperture 351.The micro drops passing through the aperture 351 enter the specificspace 300 a. Accordingly, the state (propagation state of ultrasonicwave, dielectric constant, etc.) of the inside of the specific space 300a changes. The degree of the change is different depending upon theproperty of the micro drops. Thus, the state of the inside of thespecific space 300 a is detected by the detection units 310 and 320,whereby the passage state of the micro drops in the specific space 300 acan be detected. Specifically, whether the micro drops enter thespecific space 300 a or not, and the size of the micro drops aredetermined.

Description of Operation of Object Passage Determination in FirstEmbodiment

Referring to FIGS. 10A, 10B and 11, the determination/control section360 controls the drives of the actuator unit 130 and the detection unit310 (first piezoelectric/electrostrictive element 313) in such a mannerthat the drive of the detection unit 310 (firstpiezoelectric/electrostrictive element 313) is synchronous with thedrive of the actuator unit 130. With this configuration, the firstpiezoelectric/electrostrictive element 313 and the first substrate 330vibrate, whereby ultrasonic wave is generated. The ultrasonic wavepropagates through the medium in the specific space 300 a to reach thesecond substrate 340. Thus, the second substrate 340 is vibrated. By thevibration of the second substrate 340, a voltage is generated on thedetection unit 320 (second piezoelectric/electrostrictive element 323).

Referring to FIG. 12, for example, the actuator unit 130 (see FIG. 11)is periodically driven by a pulse wave having a predetermined cycle(frequency f1) as illustrated in a time chart (a). The drive pulse ofthe actuator unit 130 is generated synchronous with the pulse wavehaving the predetermined cycle (frequency f2) for driving the detectionunit 310 (first piezoelectric/electrostrictive element 313 in FIGS. 10Aand 10B) as illustrated in a time chart (b). In this case, the frequencyf1 is generally equal to the frequency f2. Further, the frequency f2 isa resonant frequency of the detection unit 310 (firstpiezoelectric/electrostrictive element 313 in FIGS. 10A and 10B).Accordingly, a waveform illustrated in a time chart (c) is generated onthe detection unit 320 (second piezoelectric/electrostrictive element323 in FIGS. 10A and 10B). This waveform is generated with apredetermined cycle (frequency f3). In this case, the frequency f3 isgenerally equal to the frequency f1 and f2.

The vibration state of the second substrate 340 changes according to thepropagating state of the vibration in the specific space 300 a. Thepropagating state of the vibration in the specific space 300 a differsdepending upon the presence of the micro drops in the specific space 300a or the size of the micro drops. Therefore, whether the micro dropsenter the specific space 300 a or not and the size of the micro dropsare determined, through the detection of the change in the propagatingstate in the specific space 300 a by the detection unit 320.

Referring to FIG. 12, a voltage Vpp (peak-to-peak voltage) is V1 at theoutput waveform (see the time chart (c)) of the detection unit 320before the actuator unit 130 (see FIG. 11) is driven. On the other hand,the voltage Vpp (peak-to-peak voltage) becomes V2, which is smaller thanV1, at the output waveform (see the time chart (c)) of the detectionunit 320 after the actuator unit 130 (see FIG. 11) is driven and whenthe micro drops enter the specific space 300 a (see FIGS. 10A and 10B).Thus, the output voltage of the detection unit 320 is acquired, wherebywhether the micro drops enter the specific space 300 a or not and thesize of the micro drops are determined.

Referring again to FIGS. 10A and 10B, the specific space 300 a issandwiched between the grounded first reference electrode 313 c and thegrounded second reference electrode 323 c, whereby the generation of theelectric field in the specific space 300 a is suppressed according tothe first embodiment. Therefore, it is prevented that the flight routeof the micro drop is curved by the electric field, when the micro dropof the sample solution is electrostatically charged, whereby theejection state is surely be detected.

According to the first embodiment, the width L of the specific space 300a is set to satisfy the following equation, supposing that thewavelength of the vibration propagating through the medium (air, etc.)in the specific space 300 a is λ, and n is a natural number.

L=nλ

Therefore, the vibration in the specific space 300 a is efficiently bepropagated. Consequently, power saving of the firstpiezoelectric/electrostrictive element 313 constituting the vibrationgenerating source is possible. Further, the sensitivity of the secondpiezoelectric/electrostrictive element 323 constituting the sensor unitcan be enhanced.

In the structure shown in FIG. 10A, the firstpiezoelectric/electrostrictive element 313 and the secondpiezoelectric/electrostrictive element 323 are arranged at the inside ofthe specific space 300 a. With this structure, the sensitivity of thesecond piezoelectric/electrostrictive element 323 constituting thesensor unit 320 for receiving ultrasonic wave can further be enhanced.Moreover, the passage detection apparatus 300 can further beminiaturized, whereby the passage of drop having more micro size cansatisfactorily be detected.

In the structure in FIG. 10B, the first piezoelectric/electrostrictiveelement 313 and the second piezoelectric/electrostrictive element 323are arranged at the outside of the specific space 300 a (so as not to beexposed to the specific space 300 a). Specifically, the inner wallsurface of the specific space 300 a is made of the surface of thedielectric member. Therefore, this structure can prevent that faultoccurs on the first piezoelectric/electrostrictive element 313 and thesecond piezoelectric/electrostrictive element 323 due to the depositionof the sample solution onto the first piezoelectric/electrostrictiveelement 313 and the second piezoelectric/electrostrictive element 323.

Another Embodiment of Structure of Detection Unit

Next, another embodiment of the structure of the detection units 310 and320 will be explained below.

Embodiment 2

FIG. 13 is an enlarged sectional view showing the structure of thedetection units 310 and 320 according to the second embodiment. Thepassage detection apparatus 300 according to this embodiment isconfigured to determine whether the micro drop of the sample solutionpasses through the specific space 300 a or not or the volume of themicro drop on the basis of the change in the dielectric constant(electrostatic capacitance of a virtual capacitor) in the specific space300 a and the propagation state of the ultrasonic wave in the specificspace 300 a. The specific structure of the passage detection apparatus300 according to the present embodiment will be described below.

Like the aforesaid first embodiment, a pulse generating source 314 isconnected to the first piezoelectric/electrostrictive element 313constituting the detection unit 310 in the present embodiment. Avoltmeter 312 b is connected to the secondpiezoelectric/electrostrictive element 323 constituting the detectionunit 320.

The first piezoelectric/electrostrictive element 313 is arranged suchthat the drive electrode 313 b is positioned at the side of the specificspace 300 a. The drive electrode 313 b is connected to a DC power supplyPS through a known capacitor C1 having electrostatic capacitance. Thesecond piezoelectric/electrostrictive element 323 is arranged such thatthe second reference electrode 323 c is positioned at the side of thespecific space 300 a. The second reference electrode 323 c is grounded.The drive electrode 313 b and the second reference electrode 323 c areconnected to a voltmeter 312 a, wherein the voltage between the driveelectrode 313 b and the second reference electrode 323 c is acquired bythe voltmeter 312 a. The voltmeter 312 b is connected to the secondpiezoelectric/electrostrictive element 323 so as to acquire the voltagebetween the signal output electrode 323 b and the second referenceelectrode 323 c.

Specifically, in the present embodiment, a virtual capacitor C2 isformed between the electrodes, which are close to the specific space 300a, of the first and second piezoelectric/electrostrictive elements 313and 323, wherein the electrostatic capacitance of the virtual capacitorC2 is changed according to the change in the dielectric constant in thespecific space 300 a (the presence of the object in the specific space300 a or the size of the object). Further, the virtual capacitor C2 isserially connected to the known capacitor C1. The partial voltage of thevirtual capacitor C2, of the voltages at both ends of the DC powersupply PS, can be acquired by the voltmeter 312 a.

As described above, the passage detection apparatus 300 according to thepresent embodiment is configured to determine whether the micro drop ofthe sample solution passes through the specific space 300 a or not orthe volume of the micro drop on the basis of the change in the partialvoltage of the virtual capacitor C2 formed between the drive electrode313 b of the first piezoelectric/electrostrictive element 313 and thesecond reference electrode 323 c of the secondpiezoelectric/electrostrictive element 323, and the change in the outputvoltage by the second piezoelectric/electrostrictive element 323.

In the present embodiment, the circuit configuration shown in FIG. 11can also be applied. In this case, the determination/control section 360in FIG. 11 is configured to include the voltmeter 312 a, voltmeter 312b, capacitor C3, and DC power supply PS in FIG. 13.

Description of Operation of Object Passage Determination in SecondEmbodiment

In the structure in the present embodiment, the drive control of thefirst piezoelectric/electrostrictive element 313 or the like or thepassage of the micro object or the like can be determined as shown inFIG. 12 by using the circuit configuration shown in FIG. 11.

Referring to FIG. 13, when the first piezoelectric/electrostrictiveelement 313 constituting the detection unit 310 is driven at apredetermined timing, ultrasonic wave is generated according to thesecond embodiment like the first embodiment. This ultrasonic wavepropagates through the medium in the specific space 300 a to reach thesecond substrate 340. Accordingly, the second substrate 340 is vibrated.The vibration of the second substrate 340 causes a voltage at the secondpiezoelectric/electrostrictive element 323. The voltage generated at thesecond piezoelectric/electrostrictive element 323 is acquired by thevoltmeter 312 b.

According to the present embodiment, the change in the partial voltageof the virtual capacitor C2 formed between the drive electrode 313 b ofthe first piezoelectric/electrostrictive element 313 and the secondreference electrode 323 c of the second piezoelectric/electrostrictiveelement 323 is acquired by the voltmeter 312 a. Then, whether the microdrop of the sample solution passes through the specific space 300 a ornot or the volume of the micro drop can be determined on the basis ofthe output of the voltmeters 312 a and 312 b. For example, when anappropriate statistical process is carried out by thedetermination/control section 360 in FIG. 11 to the result of thedetection on the basis of the output from the voltmeter 312 a and theresult of the detection on the basis of the voltmeter 312 b, the passageof the object can be detected with higher reliability, regardless of theproperty of the object (size, chargeabililty, etc.).

Embodiment 3

FIG. 14 is an enlarged sectional view showing the structure of thedetection units 310 and 320 according to the third embodiment. In thisembodiment, the detection unit 310 is comprised of the firstpiezoelectric/electrostrictive element 313 same as that in the first andsecond embodiments. In the present embodiment, the detection unit 320 iscomprised of an electrostatic microphone 325, different from the firstembodiment.

The electrostatic microphone 325 has a vibration plate 325 a, supportplate 325 b, spacer 325 c, first detection electrode 325 d, and seconddetection electrode 325 e, wherein a voltage according to appliedexternal force is produced between the first detection electrode 325 dand the second detection electrode 325 e.

The vibration plate 325 a is made of a dielectric layer having a thinplate shape, and is a member for constituting the outer wall enclosingthe specific space 300 a (a member corresponding to the second substrate340 [see FIGS. 10A and 10B] in the aforesaid first embodiment).Specifically, the inner surface of the electrostatic microphone 325facing the specific space 300 a is made of the inner surface 325 a 1 ofthe vibration plate 325 a. The support plate 325 b is made of adielectric layer having a thin plate shape. The support plate 325 b isarranged so as to be parallel to the vibration plate 325 a with apredetermined gap. The spacer 325 c is a plate-like member formed withmultiple through-holes, and is arranged between the vibration plate 325a and the support plate 325 b so as to form a predetermined gap betweenthe vibration plate 325 a and the support plate 325 b by thethrough-holes.

As described above, the vibration plate 325 a is arranged to be bridgedin the through-holes formed to the spacer 325 c. The vibration plate 325a is arranged at the position opposite to the firstpiezoelectric/electrostrictive element 313 serving as the vibrationgenerating source. The vibration plate 325 a is configured to vibrate bythe propagation of the vibration, generated from the firstpiezoelectric/electrostrictive element 313, through the medium in thespecific space 300 a.

The first detection electrode 325 d is formed on the outer surface 325 a2, which is the backside of the inner surface 325 a 1, of the vibrationplate 325 a. The first detection electrode 325 d is connected to the DCpower supply PS through a known capacitor C3 having electrostaticcapacitance. The second detection electrode 325 e is formed on the innersurface 325 b 1, which faces the vibration plate 325 a, of the supportplate 325 b, and arranged parallel to the first detection electrode 325d. The second detection electrode 325 e is grounded. The first detectionelectrode 325 d and the second detection electrode 325 e are connectedto the voltmeter 312 so as to acquire the voltage between the firstdetection electrode 325 d and the second detection electrode 325 e.

Specifically, a virtual capacitor C4 is formed in the electrostaticmicrophone 325 by the first detection electrode 325 d and the seconddetection electrode 325 e. The virtual capacitor C4 is configured tochange its electrostatic capacitance depending upon the change in thedistance of the gap, caused by the vibration of the vibration plate 325a, between the first detection electrode 325 d and the second detectionelectrode 325 e. The virtual capacitor C4 is serially connected to theaforesaid known capacitor C3. The voltmeter 312 is connected to thefirst detection electrode 325 d and the second detection electrode 325 ein such a manner that the partial voltage of the virtual capacitor C4,of the voltages at both ends of the DC power supply PS, can be acquiredby the voltmeter 312.

As described above, the electrostatic microphone 325 in this embodimentis configured to output a signal according to the vibrating state of thevibration plate 325 a on the basis of the change in the partial voltageof the virtual capacitor C4. The passage detection apparatus 300 in thepresent embodiment is configured to determine whether or not the microdrop of the sample solution passes through the specific space 300 a orthe volume of the micro drop, through the detection of the propagationstate of the ultrasonic wave in the specific space 300 a on the basis ofthe change in the voltage at both ends of the voltmeter 312.

In the present embodiment, the circuit configuration shown in FIG. 11can also be used. In this case, the determination/control section 360 inFIG. 11 is configured to include the voltmeter 312, capacitor C3, and DCpower supply PS in FIG. 14.

Description of Operation of Object Passage Determination in ThirdEmbodiment

Referring to FIG. 14, according to the structure of the thirdembodiment, when the first piezoelectric/electrostrictive element 313constituting the detection unit 310 is driven at a predetermined timing,ultrasonic wave is generated.

In the present modification, the vibration plate 325 a vibrates due tothe ultrasonic wave propagated to the detection unit 320 through themedium in the specific space 300 a. The distance of the gap between thefirst detection electrode 325 d and the second detection electrode 325 echanges (specifically, the electrostatic capacitance of the virtualcapacitor C4 changes) by the vibration of the vibration plate 325 a.With the change of the electrostatic capacitance of the virtualcapacitor C4, the change in the partial voltage of the virtual capacitorC4 is acquired by the voltmeter 312. The state of the change in thepartial voltage varies depending upon whether the micro drop enters thespecific space 300 a or not and the size of the micro drop as shown inFIG. 12( c). Consequently, whether the micro drop enters the specificspace 300 a or not and the size of the micro drop can be determined.

According to the configuration of the present embodiment, variousmaterials can be selected as the material for the vibration plate 325 a.For example, a film made of synthetic resin may be used as the vibrationplate 325 a. In this case, the first detection electrode 325 d can alsobe formed easily into a thin film by the application of a metallizedfilm. Accordingly, the whole rigidity of the vibration plate 325 a andthe first detection electrode 325 d reduces, whereby the vibration plate325 a greatly vibrates due to a slight vibration of the medium in thespecific space 300 a. Therefore, the slight change of the vibrationstate of the medium can appear as the great change of the vibrationstate at the vibration plate 325 a. Consequently, the sensitivity indetecting a passage of an object can further be enhanced.

Embodiment 4

FIGS. 15A and 15B are enlarged sectional views showing the structure ofthe detection units 310 and 320.

In the present embodiment, the detection unit 310 is comprised of aplate-like first electrode 311 supported on the first substrate 330. Thefirst substrate 330 is comprised of a plate-like dielectric layer. Thefirst electrode 311 is connected to a DC power supply PS through a knowncapacitor C1 having an electrostatic capacitance.

In the present embodiment, the detection unit 320 is comprised of aplate-like second electrode 321 supported on the second substrate 340.The second substrate 340 is comprised of a plate-like dielectric layer.The second electrode 321 is grounded, and arranged parallel to the firstelectrode 311 across the specific space 300 a. The first electrode 311and the second electrode 321 are connected to the voltmeter 312, and thevoltage between the first electrode 311 and the second electrode 321 isacquired by the voltmeter 312.

Specifically, in the present embodiment, a pair of detection units 310and 320 forms a virtual capacitor C2, wherein the electrostaticcapacitance of the virtual capacitor C2 is changed according to thechange in the dielectric constant in the specific space 300 a (thepresence of the object in the specific space 300 a or the size of theobject), which is the space between the detection unit 310 and thedetection unit 320. The virtual capacitor C2 is serially connected tothe known capacitor C1. The voltmeter 312 is connected to the firstelectrode 311 and the second electrode 321 in such a manner that thepartial voltage, of the voltages at both ends of the DC power supply PS,of the virtual capacitor C2 can be acquired b the voltmeter 312.

As described above, the passage detection apparatus 300 according to thepresent embodiment is configured to determine whether the micro drop ofthe sample solution passes through the specific space 300 a or not orthe volume of the micro drop on the basis of the change in the partialvoltage of the virtual capacitor C2

In the structure shown in FIG. 15A, the first electrode 311 is providedon the inner surface 330 a of the first substrate 330. The secondelectrode 321 is provided on the inner surface 340 a of the secondsubstrate 340. Specifically, the first electrode 311 and the secondelectrode 321 are arranged to face the specific space 300 a.

In the structure shown in FIG. 15B, the first electrode 311 is providedon the outer surface 330 b of the first substrate 330. The secondelectrode 321 is provided on the outer surface 340 b of the secondsubstrate 340. Specifically, the first electrode 311 and the secondelectrode 321 are arranged at the outside of the specific space 300 a(so as not to be exposed to the specific space 300 a).

Circuit Configuration for Determination of Passage of Object in FourthEmbodiment

Next, the circuit configuration for determining the ejection state ofthe micro drop of the sample solution from the micropipette 100 (seeFIG. 8) by using the structure in the fourth embodiment will beexplained with reference to FIG. 16.

As shown in FIG. 16, the present embodiment employs a simple circuitconfiguration in which the detection units 310 and 320 are connected tothe determination/control unit 360. The determination/control unit 360has a circuit configuration including the capacitor C1, voltmeter 312,and DC power supply PS in FIGS. 15A and 15B.

Description of Operation of Object Passage Determination in FourthEmbodiment

According to the fourth embodiment shown in FIGS. 15A and 15B, thedielectric constant in the specific space 300 a changes when the microdrop enters the specific space 300 a. The change in the dielectricconstant changes the electrostatic capacitance (or impedance) of thevirtual capacitor C2 formed between the first electrode 311 and thesecond electrode 321. The value of the voltage acquired by the voltmeter312 is changed by the change in the electrostatic capacitance. Whetherthe micro drop enters the specific space 300 a or not and the size ofthe micro drop can be determined by the change in the voltage value.

In the structure shown in FIG. 15A, the first electrode 311 and thesecond electrode 321 are arranged to face the specific space 300 a.According to this structure, the distance between the electrodes in thevirtual capacitor C2 reduces, and the dielectric layer (first substrate330 or the second substrate 340) is not interposed between the firstelectrode 311 and the second electrode 321. Therefore, even the passageof an extremely micro drop (e.g., picoliter order) can be detected withhigh sensitivity.

In the structure shown in FIG. 15B, the first electrode 311 and thesecond electrode 321 are arranged at the outside of the specific space300 a (so as not to be exposed to the specific space 300 a).Specifically, the inner wall surface of the specific space 300 a is madeof the surface of the dielectric member. According to the structuredescribed above, the occurrence of fault (short-circuit betweenelectrodes or corrosion) on the first electrode 311 and the secondelectrode 321 due to the deposition of the micro drop can be prevented.Consequently, the passage state of the sample solutions having variousproperties in the specific space 300 a can be satisfactorily detected.

Embodiment 5

FIG. 17 is an enlarged sectional view showing the structure of thedetection units 310 and 320 according to the fifth embodiment. Thepassage detection apparatus 300 according to the present embodiment hasa structure in which the second embodiment shown in FIG. 13 and thethird embodiment shown in FIG. 14 are combined. Specifically, thepassage detection apparatus 300 according to the present embodiment isconfigured to determine whether or not the micro drop of the samplesolution passes through the specific space 300 a or the volume of themicro drop on the basis of the change in the electrostatic capacitancein the specific space 300 a and the propagation state of the ultrasonicwave in the specific space 300 a, like the second embodiment shown inFIG. 13. The structure in the present embodiment is the same as thestructure of the second embodiment except that an electrostaticmicrophone 326 is used as the detection unit 320 instead of the secondpiezoelectric/electrostrictive element 323 (see FIG. 13) and theelectric circuit configuration involved with the electrostaticmicrophone 326 is slightly different from that in the second embodiment.

Specifically, the first piezoelectric/electrostrictive element 313 isarranged such that the drive electrode 313 b is positioned at the sideof the specific space 300 a. The drive electrode 313 b is connected tothe DC power supply PS through a known capacitor C1 having anelectrostatic capacitance. The pulse generating source 314 is connectedto the drive electrode 313 b and the first reference electrode 313 c.

The electrostatic microphone 326 in the present embodiment has avibration plate 326 a, support plate 326 b, spacer 326 c, firstdetection electrode 326 d, and second detection electrode 326 e, thoseof which are the same as the vibration plate 325 a, support plate 325 b,spacer 325 c, first detection electrode 325 d, and second detectionelectrode 325 e of the electrostatic microphone 325 in FIG. 14, andfurther has a second electrode 326 f. The second electrode 326 f isformed on the inner surface 326 f 1 of the vibration plate 326 a. Thefirst detection electrode 326 d is connected to a DC power supply PS2through a known capacitor C3 having an electrostatic capacitance. Thesecond detection electrode 326 e is grounded.

The second electrode 326 f of the electrostatic microphone 326 and thedrive electrode 313 b of the first piezoelectric/electrostrictiveelement 313 are arranged so as to face the specific space 300 a, andthey are connected to the voltmeter 312 a. The first detection electrode325 d and the second detection electrode 325 e are connected to thevoltmeter 312 b.

As described above, the passage detection apparatus 300 in the presentembodiment is configured to determine whether or not the micro drop ofthe sample solution passes through the specific space 300 a and thevolume of the micro drop on the basis of the change in the partialvoltage of the virtual capacitor C2 in the serial circuit of the knowncapacitor C1 and the virtual capacitor C2, and the change in the partialvoltage of the virtual capacitor C4 in the serial circuit formed by theknown capacitor C3 and the virtual capacitor C4 formed by theelectrostatic microphone 326.

Description of Operation of Object Passage Determination in FifthEmbodiments

In the structure of the present embodiment, the drive control of thefirst piezoelectric/electrostrictive element 313, etc. and the passageof the micro object or the like can be determined as shown in FIG. 12 byusing the circuit configuration shown in FIG. 11.

Referring to FIG. 17, according to the structure of the fifthembodiment, when the first piezoelectric/electrostrictive element 313constituting the detection unit 310 is driven at a predetermined timing,ultrasonic wave is generated like the second embodiment. This ultrasonicwave propagates through the medium in the specific space 300 a to reachthe vibration plate 326 a. Accordingly, the vibration plate 326 a isvibrated. By the vibration of the vibration plate 326 a, the distance ofthe gap between the first detection electrode 326 d and the seconddetection electrode 326 e changes (i.e., the electrostatic capacitanceof the capacitor C4 changes). With the change of the electrostaticcapacitance of the virtual capacitor C4, the partial voltage generatedat both ends of the virtual capacitor C4 in the serial circuit made bythe virtual capacitor C4 and the known capacitor C3 changes.Specifically, the voltage generated at the electrostatic microphone 326changes. The voltage generated at the electrostatic microphone 326 isacquired by the voltmeter 312 b.

According to the present embodiment, the change in the partial voltageof the virtual capacitor C2, which is formed between the drive electrode313 b of the first piezoelectric/electrostrictive element 313 and thesecond electrode 326 f of the electrostatic microphone 326 is acquiredby the voltmeter 312 a, like the aforesaid second embodiment. Whetherthe micro object of the sample solution passes through the specificspace 300 a or not or the volume of the micro object can be determinedon the basis of the output from the voltmeters 312 a and 312 b. Forexample, when an appropriate statistical process is carried out by thedetermination/control section 360 in FIG. 11 to the result of thedetection on the basis of the output from the voltmeter 312 a and theresult of the detection on the basis of the voltmeter 312 b, the passageof the object can be detected with higher reliability, regardless of theproperty of the object (size, chargeability, etc.).

<Suggestion of Modifications>

The above-described embodiment has been disclosed merely to illustraterepresentative embodiment of the present invention considered as themost preferred embodiments at the time of filing of the presentapplication. Consequently, the present invention is not limited to theabove-described embodiments, and it is appreciated that variousmodifications are possible without changing essential parts of thepresent invention.

Hereinafter, a few modifications will be illustrated within the limitsof addition possible at the time of filing of the present application(as far as time is allowed) under the first-to-file rule. However, it isnot necessary to mention that the present invention is also not limitedto these modifications. Limiting the present invention based on thedisclosures of the embodiments described above and the modificationsdescribed below (especially, limiting the respective componentsconstituting the means to solve the problems of the present invention,particularly, the components which are expressed operatively andfunctionally, based on the description of the preferred embodiments) isnot allowed because the limitation trespasses on benefits of theapplicant who has hastened to file the application under thefirst-to-file rule, the limitation provides imitators with undueprofits, and therefore, the limitation is opposed to the purpose of thepatent law prescribing the protection and utilization of the invention.Furthermore, it is not necessary to mention that the followingmodifications can be appropriately combined with each other within thescope of consistency.

(i) The present invention is not limited to the micropipettes disclosedin the above-described embodiment. Also, the flight direction of themicro object is not limited to the vertically-downward direction. As thevibration used for the passage detection, sound wave or heat can beutilized in addition to ultrasonic wave. Further, there is no limitationon the medium through which the micro object passes. For example, thepresent invention is preferably applicable even in case where variousgases in addition to air, or liquid such as water, oil, etc. are used asthe medium.

(ii) The manner of mounting the first piezoelectric/electrostrictiveelement 313 to the first substrate 330 and the manner of mounting thesecond piezoelectric/electrostrictive element 323 to the secondsubstrate 340 in FIGS. 10A and 10B can be modified to the manner otherthan the manner illustrated in the figure. For example, one of the firstpiezoelectric/electrostrictive element 313 and the secondpiezoelectric/electrostrictive element 323 may be arranged to face thespecific space 300 a, and the other may be arranged at the outside ofthe specific space 300 a. Further, the firstpiezoelectric/electrostrictive element 313 may be arranged such that thedrive electrode 313 b faces the specific space 300 a. Alternatively, thesecond piezoelectric/electrostrictive element 323 may be arranged suchthat the signal output electrode 323 faces the specific space 300 a.

(iii) In FIG. 13, the first piezoelectric/electrostrictive element 313may be arranged on the outer surface 330 b. The secondpiezoelectric/electrostrictive element 323 may be arranged on the outersurface 340 b.

(iv) The known capacitors C1 and C3 in FIGS. 13 to 15 and 17 can bereplaced by a resister. An optional circuit configuration may beemployed for the circuit configuration in each of the above-mentionedfigures.

(v) The manner other than the illustrated one can be employed for themanner of mounting the first piezoelectric/electrostrictive element 313to the first substrate 330 in FIG. 14. For example, the firstpiezoelectric/electrostrictive element 313 may be arranged on the outersurface 330 b. Further, the first piezoelectric/electrostrictive element313 may be arranged such that the first reference electrode 313 c facesthe specific space 300 a.

(vi) The vibration plate 325 a and the support plate 325 b in FIG. 14may be made of a conductive material. By virtue of this structure, thefunctions of the first detection electrode 325 d and the seconddetection electrode 325 e may be provided to the vibration plate 325 aand the support plate 325 b.

(vii) The width of the specific space 300 a in FIGS. 14 to 17 can alsoconfigured to satisfy the above-mentioned equation.

(viii) In FIG. 17, the first piezoelectric/electrostrictive element 313may be arranged on the outer surface 330 b.

(ix) In FIG. 17, the first detection electrode 326 d and the voltmeter312 a may be connected to each other, whereby the second electrode 326 fmay be omitted. Specifically, the electrostatic microphone 326 may beconfigured in such a manner that the first detection electrode 326 d hasthe function same as that of the second electrode 321 in FIGS. 15A and15B. In particular, the first piezoelectric/electrostrictive element 313is arranged on the outer surface 330 b, and the above-mentionedconfiguration of omitting the second electrode 326 f is employed,whereby the configuration in which the inner surfaces 330 a and 326 a 1of the first substrate 330 and the vibration plate 326 a (secondsubstrate) face the specific space 300 a can be realized. In this case,the vibration plate 326 a and the support plate 326 b may be made of aconductive material. By virtue of this structure, the function of thefirst detection electrode 326 d and function of the second detectionelectrode 326 e can be provided to the vibration plate 326 a and thesupport plate 326 b.

(x) A multi-layer piezoelectric/electrostrictive element 315 shown inFIG. 18 may be employed as the piezoelectric/electrostrictive element313 constituting the detection unit 310 serving as the vibrationgenerating source in FIGS. 10 to 17. Accordingly, the intensity of thegenerated ultrasonic wave is enhanced, so that the passage can bedetected with enhanced sensitivity.

In this case, as illustrated in FIG. 19, the detection unit 310 servingas the vibration generating source and the detection unit 320 forreception have the different structure. With this structure, the primaryresonance frequencies of the detection unit 310 serving as the vibrationgenerating source and the detection unit 320 for the reception are equalto each other, but the high-order resonance frequencies are differentfrom each other.

In this configuration, the output from the detection unit 320 for thereception on the basis of the vibration other than the desired vibrationmode in the detection unit 310 for the transmission is suppressed.Therefore, the S/N ratio in detecting the passage of an object isenhanced. Accordingly, a detection of a more micro object becomespossible with this configuration.

(xi) The structure shown in FIG. 20 can be employed as the structure ofthe first substrate 330 that supports the detection unit 310. In FIG.20, a piezoelectric/electrostrictive element is illustrated as anexample of the structure of the detection unit 310. It is to be notedthat the specific structure of the detection unit 310 is not limited inthe explanation of the modification.

In this modification, the first substrate 330 has a plate-like thinvibration plate 331, and plate-like thick support plate 332 formed atboth sides of the thin vibration plate 331, wherein the thin vibrationplate 331 and the thick support plate 332 are integrally formed. Thethick support plate 332 is made of a material same as the material ofthe thin vibration plate 331, and formed to be thicker than the thinvibration plate 331. The detection unit 310 is attached to the thinvibration plate 331.

According to this structure, the first substrate 330 is configured suchthat the thin vibration plate 331 is bridged between the adjacent thicksupport plates 332. Therefore, the vibration can be generated from thedetection unit 310, serving as the vibration generating source, withhigh output.

As shown in FIG. 20, the outer surface 330 b of the first substrate 330in the present modification is made of the outer surfaces of the thinvibration plate 331 and the thick support plates 332. Specifically, thefirst substrate 330 in the present modification is configured such thatthe outer surface of the thin vibration plate 331 and the outer surfaceof the thick support plate 332 are continuous on the same plane. Thefirst substrate 330 is configured such that the space enclosed by theinner surface 330 of the first substrate, which is made of the innersurface of the thin vibration plate 331, and the side face 332 a of thethick support plate 332 (the space at the inside of the concave portionformed at the side of the inner surface 330 a of the first substrate330) is included in the specific space 300 a.

According to this structure, the above-mentioned concave portioncomposing the specific space 300 a is formed at the side of the innersurface 330 a of the first substrate 330. Therefore, a part of thespecific space 300 a can be formed in the range of the thickness of thefirst substrate 330. Accordingly, the passage detection apparatus can beminiaturized.

The side face 332 a of the thick support plate 332 shown in FIG. 20 maybe configured to be capable of reflecting sound wave or ultrasonic wave.

According to the above-mentioned structure, sound wave or ultrasonicwave can be reflected with high efficiency by the side face 332 a of thethick support plate 332, which constitutes the inner wall surface of theabove-mentioned concave portion composing the specific space 300 a.Therefore, the directivity when the sound wave or ultrasonic wavepropagates through the medium in the specific space 300 a is enhanced.Consequently, the passage can satisfactorily be detected even though theoutput of the detection unit 310 constituting the vibration generatingsource is reduced to reduce the power consumption.

Although it is illustrated in FIG. 20 as if the detection unit 310 isattached to the outer surface 330 b of the first substrate 330 (thinvibration plate 331), the present modification is not limited thereto.Specifically, the detection unit 310 may be attached to the innersurface 330 a of the first substrate 330 (thin vibration plate 331).

(xii) The structure shown in FIG. 21 can be applied as the structure ofthe second substrate 340 for supporting the detection unit 320. It is tobe noted that FIG. 21 shows the piezoelectric/electrostrictive elementas one example of the structure of the detection unit 320, but thespecific structure of the detection unit 320 is not limited in theexplanation of the present modification (for example, the electrostaticmicrophone 325 in FIG. 14 or the electrostatic microphone 326 in FIG. 17can be employed).

In the present modification, the second substrate 340 has a plate-likethin vibration plate 341, and plate-like thick support plates 342 formedat both sides of the thin vibration plate 341, wherein the thinvibration plate 341 and the thick support plate 342 are integrallyformed. The thick support plate 342 is made of a material same as thematerial of the thin vibration plate 341, and formed to be thicker thanthe thin vibration plate 341. The detection unit 320 is attached to thethin vibration plate 341.

According to this structure, the second substrate 340 according to thismodification is configured such that the thin vibration plate 341 isbridged between the adjacent thick support plates 342. Therefore, thethin vibration plate 341 can be vibrated with high efficiency by thevibration propagated through the medium in the specific space 300 a.Accordingly, the detection unit 320 receives the vibration with highsensitivity, whereby the passage or the like of the object can bedetected with high sensitivity.

As shown in FIG. 21, the outer surface 340 b of the second substrate 340in the present modification is made of the outer surfaces of the thinvibration plate 341 and the thick support plates 342. Specifically, thesecond substrate 340 in the present modification is configured such thatthe outer surface of the thin vibration plate 341 and the outer surfaceof the thick support plate 342 are continuous on the same plane. Thesecond substrate 340 is configured such that the space enclosed by theinner surface 340 a of the second substrate, which is made of the innersurface of the thin vibration plate 341, and the side face 342 a of thethick support plate 342 (the space at the inside of the concave portionformed at the side of the inner surface 340 a of the second substrate340) is included in the specific space 300 a.

According to this structure, the above-mentioned concave portioncomposing the specific space 300 a is formed at the side of the innersurface 340 a of the second substrate 340. Therefore, a part of thespecific space 300 a can be formed in the range of the thickness of thesecond substrate 340. Accordingly, the passage detection apparatus canbe miniaturized.

The side face 342 a of the thick support plate 342 shown in FIG. 21 maybe configured to be capable of reflecting sound wave or ultrasonic wave.

According to the above-mentioned structure, sound wave or ultrasonicwave can be reflected with high efficiency by the side face 342 a of thethick support plate 342, which constitutes the inner wall surface of theabove-mentioned concave portion composing the specific space 300 a.Therefore, the directivity when the sound wave or ultrasonic wavepropagates through the medium in the specific space 300 a is enhanced.Consequently, the passage can satisfactorily be detected even though theoutput of the detection unit 320 is reduced to reduce the powerconsumption.

Although it is illustrated in FIG. 21 as if the detection unit 320 isattached to the outer surface 340 b of the second substrate 340 (thinvibration plate 341), the present modification is not limited thereto.Specifically, the detection unit 320 may be attached to the innersurface 340 a of the second substrate 340 (thin vibration plate 341).

(xiii) As shown in FIG. 22, the first substrate 330 and the secondsubstrate 340 may be configured as illustrated in FIGS. 20 and 21. Inthe structure described above, the specific space 300 a is substantiallyformed by the space enclosed by the inner surface 330 a of the thinvibration plate 331 at the first substrate 330, the side face 332 a ofthe thick support plate 332 at the first substrate 330, the innersurface 340 a of the thin vibration plate 341 at the second substrate340, and the side face 342 a of the thick support plate 342 at thesecond substrate 340.

According to the structure described above, nearly entire specific space300 a can be formed within the range of the thickness obtained bysuperimposing the first substrate 330 and the second substrate 340.Therefore, the passage detection apparatus can further be miniaturized.

The side face 332 a of the thick support plate 332 at the firstsubstrate 330 and the side face 342 a of the thick support plate 342 atthe second substrate 340 may be configured to be smooth to an extent ofbeing capable of nearly totally reflecting sound wave or ultrasonicwave. With this structure, the passage can be detected with enhancedsensitivity by a simplified structure.

(xiv) When the detection unit 310 is provided on the inner surface 330 aof the first substrate 330, it is preferable that an insulating coatinglayer 319 that covers the detection unit 310 is formed on the innersurface 330 a as shown in FIGS. 23A and 23B. By virtue of thisstructure, it is prevented that the detection unit 310 is attacked, eventhough the sample solution is corrosive or conductive, whereby thepassage of the object and/or the size of the object can satisfactorilybe determined.

Similarly, when the detection unit 320 is provided on the inner surface340 a of the second substrate 340, it is preferable that an insulatingcoating layer 329 that covers the detection unit 320 is formed on theinner surface 340 a as shown in FIGS. 23C and 23D.

(xv) A piezoelectric polymer film can be used as the detection unit 320.Accordingly, very small sound wave (ultrasonic wave) can be detected, sothat the sensitivity in detecting the passage of the object can beenhanced.

(xvi) In the aforesaid embodiments, the width L of the specific space300 a is set so as to satisfy the following equation, supposing that thewavelength of the vibration propagating through the medium (air, etc.)in the specific space 300 a is λ, and n is a natural number.

L=nλ

It is to be noted that, instead of the above-mentioned structure, thewidth L may be set so as to satisfy the following equation, supposingthat m is a natural number.

L=(m/2)·λ

(xvii) As shown in FIG. 24, an element noise reducing shield member 392may be provided. The element noise reducing shield member 392 isprovided in such a manner that the element portions (the firstpiezoelectric/electrostrictive element 313 or the secondpiezoelectric/electrostrictive element 323, etc.) for transmission andreception at the detection unit 310 and the detection unit 320 areopposite to each other and the portion other than the element portionsare covered in all directions.

As shown in FIG. 25, a circuit noise reducing shield member 395 may beprovided. The circuit noise reducing shield member 395 is configured tocover the electric circuit such as the determination/control section360, etc. for eliminating electrical noise exerted on the electriccircuit.

In the structure described above, electrical noise is eliminated.Therefore, SIN ratio in the detection of the passage of the object isenhanced. Accordingly, a more micro object can be detected with highprecision by the structure described above.

Increasing sensitivity achieved by the reduction of noise can berealized by employing at least any one of the element noise reducingshield member 392 that covers the detection unit 310, the element noisereducing shield member 392 that covers the detection unit 320, and thecircuit noise reducing shield member 395. It suffices that the circuitnoise reducing shield member 395 shields at least thedetermination/control section 360.

(xviii) As shown in FIG. 25, a band pass filter 397 may be provided inthe circuit configuration as the determination unit. The band passfilter 397 is interposed between the detection unit 320 and thedetermination/control unit 360. The band pass filter 397 is configuredto limit the frequency of the output at the detection unit 320 to theband around the desired resonance frequency (specifically, within therange of ±10% of the desired resonance frequency, for example).

In the structure described above, a mechanical noise is eliminated thatis based upon ambient sound wave or the vibration or the like of anunnecessary mode other than the vibration of the desired modecorresponding to the desired resonant frequency. Accordingly, the S/Nratio for the detection of the passage of the object is enhanced.Consequently, an object having more micro size can be detected with highprecision.

The band pass filter 397 can be provided in the determination/controlsection 360.

(xxiv) In addition, the respective components constituting the means tosolve the problems of the present invention, particularly, thecomponents which are expressed operatively and functionally, include allstructures that can be operatively and functionally realized in additionto the clearly defined structures disclosed in the above-describedembodiments and modifications.

1. A passage detection apparatus of an object that can detect a passageof an object in a specific space, comprising: a vibration generatingsource; a sensor unit that is arranged at a position corresponding tothe vibration generating source across the specific space, andconfigured to be capable of generating an output according to thevibration, which propagates through a medium in the specific space, fromthe vibration generating source; a determination unit that determinesthe passage of the object in the specific space on the basis of theoutput from the sensor unit; a first substrate comprised of a plate-likedielectric layer, which supports the firstpiezoelectric/electrostrictive element; and a second substrate comprisedof a plate-like dielectric layer, which supports the secondpiezoelectric/electrostrictive element, wherein the vibration generatingsource is comprised of a first piezoelectric/electrostrictive elementthat has a drive electrode and a first reference electrode formed atboth sides of a first dielectric layer, the sensor unit is comprised ofa second piezoelectric/electrostrictive element that has a signal outputelectrode and a second reference electrode formed at both sides of asecond dielectric layer, the specific space is formed by a space betweenthe first substrate and the second substrate, and the first substrateand the second substrate are arranged in such a manner that the distanceL between the inner surface of the first substrate and the inner surfaceof the second substrate satisfies the equation ofL=nλ or L=(m/2)·λ wherein the wavelength of the vibration propagatingthrough the medium is λ, and n and m are natural numbers.
 2. A passagedetection apparatus of an object according to claim 1, wherein thevibration generating source and the sensor unit are arranged in such amanner that the first reference electrode and the second referenceelectrode are arranged at the side close to the specific space.
 3. Apassage detection apparatus of an object according to claim 2, whereinthe first piezoelectric/electrostrictive element is supported on aninner surface, which is the surface at the side of the specific space,of the first substrate, and the second piezoelectric/electrostrictiveelement is supported on an inner surface, which is the surface at theside of the specific space, of the second substrate.
 4. A passagedetection apparatus according to claim 3, wherein the first substratehas a plate-like thin part and a plate-like thick part that is formed atboth sides of the thin part and is thicker than the thin part, whereinthe first substrate is formed such that an outer surface of the thinpart and an outer surface of the thick part are continuous on a sameplane, the vibration generating source is attached to the thin part ofthe first substrate, and the specific space includes a space enclosed byan inner surface of the thin part at the first substrate and a side faceof the thick part at the first substrate.
 5. A passage detectionapparatus according to claim 4, wherein the second substrate has aplate-like thin part and a plate-like thick part that is formed at bothsides of the thin part and is thicker than the thin part, wherein thesecond substrate is formed such that an outer surface of the thin partand an outer surface of the thick part are continuous on a same plane,the sensor unit is attached to the thin part of the second substrate,and the specific space includes a space enclosed by an inner surface ofthe thin part at the second substrate and a side face of the thick partat the second substrate.
 6. A passage detection apparatus of an objectaccording to claim 2, wherein the first piezoelectric/electrostrictiveelement is supported on an outer surface, which is the surface reverseto an inner surface at the side of the specific space, of the firstsubstrate, and the second piezoelectric/electrostrictive element issupported on an outer surface, which is the surface reverse to an innersurface at the side of the specific space, of the second substrate.
 7. Apassage detection apparatus according to claim 6, wherein the firstsubstrate has a plate-like thin part and a plate-like thick part that isformed at both sides of the thin part and is thicker than the thin part,wherein the first substrate is formed such that an outer surface of thethin part and an outer surface of the thick part are continuous on asame plane, the vibration generating source is attached to the thin partof the first substrate, and the specific space includes a space enclosedby an inner surface of the thin part at the first substrate and a sideface of the thick part at the first substrate.
 8. A passage detectionapparatus according to claim 7, wherein the second substrate has aplate-like thin part and a plate-like thick part that is formed at bothsides of the thin part and is thicker than the thin part, wherein thesecond substrate is formed such that an outer surface of the thin partand an outer surface of the thick part are continuous on a same plane,the sensor unit is attached to the thin part of the second substrate,and the specific space includes a space enclosed by an inner surface ofthe thin part at the second substrate and a side face of the thick partat the second substrate.
 9. A passage detection apparatus of an objectaccording to claim 2, wherein the first reference electrode and thesecond reference electrode are configured to have the same potential.10. A passage detection apparatus of an object according to claim 2,wherein the first reference electrode and the second reference electrodeare configured to have a different potential.
 11. A passage detectionapparatus of an object that can detect a passage of an object in aspecific space, comprising: a vibration generating source; a sensor unitthat is arranged at a position corresponding to the vibration generatingsource across the specific space, and configured to be capable ofgenerating an output according to the vibration, which propagatesthrough a medium in the specific space, from the vibration generatingsource; and a determination unit that determines the passage of theobject in the specific space on the basis of the output from the sensorunit, wherein the sensor unit includes: a vibration plate made of aplate-like dielectric layer and constitutes an outer wall enclosing thespecific space; a first detection electrode formed to the vibrationplate; a support plate arranged parallel to the vibration plate with apredetermined gap; and a second detection electrode formed on an innersurface, which faces the vibration plate, of the support plate, andarranged parallel to the first detection electrode, wherein thedetermination unit is configured to determine the passage of the objectin the specific space on the basis of an electrostatic capacitancebetween the first detection electrode and the second detectionelectrode.
 12. A passage detection apparatus of an object according toclaim 11, wherein the vibration generating source is comprised of afirst piezoelectric/electrostrictive element that has a drive electrodeand a first reference electrode formed at both sides of a firstdielectric layer, the passage detection apparatus further comprises afirst substrate made of a plate-like dielectric layer for supporting thefirst piezoelectric/electrostrictive element, and the specific space isformed by the space between an inner surface of the first substrate andan inner surface of the vibration plate.
 13. A passage detectionapparatus of an object according to claim 12, wherein the firstsubstrate has a plate-like thin part and a plate-like thick part that isformed at both sides of the thin part and is thicker than the thin part,wherein the first substrate is formed such that an outer surface of thethin part and an outer surface of the thick part are continuous on asame plane, the first piezoelectric/electrostrictive element is attachedto the thin part of the first substrate, and the specific space includesa space enclosed by an inner surface of the thin part at the firstsubstrate and a side face of the thick part at the first substrate. 14.A passage detection apparatus of an object according to claim 13,wherein the first substrate and the vibration plate are arranged in sucha manner that the distance L between the inner surface of the firstsubstrate and the inner surface of the vibration plate satisfies theequation ofL=nλ or L=(m/2)·λ wherein the wavelength of the vibration propagatingthrough the medium is λ, and n and m are natural numbers.
 15. A passagedetection apparatus of an object that can detect a passage of an objectin a specific space, comprising: a vibration generating source; a sensorunit that is arranged at a position corresponding to the vibrationgenerating source across the specific space, and configured to becapable of generating an output according to the vibration, whichpropagates through a medium in the specific space, from the vibrationgenerating source; and a determination unit that determines the passageof the object in the specific space on the basis of the output from thesensor unit, wherein: the vibration generating source and the sensorunit are configured such that the resonance frequency of the vibrationgenerating source and the resonance frequency of the sensor unit aregenerally the same in a first vibration mode, and the resonancefrequency of the vibration generating source and the resonance frequencyof the sensor unit are different from each other at a second vibrationmode that is different from the first vibration mode.
 16. A passagedetection apparatus of an object according to claim 15, furthercomprising: drive means for driving the vibration generating source,wherein the drive means outputs a pulse signal having a cyclecorresponding to the resonance frequency of the vibration generatingsource in order to drive the vibration generating source.
 17. A passagedetection apparatus of an object according to claim 16, wherein thedrive means is configured to output the pulse signal in synchronism withthe passage timing of the object.
 18. A passage detection apparatus ofan object according to claim 17, wherein the sensor unit is configuredto output a voltage according to the propagation state of the vibrationfrom the vibration generating source; and the determination unit isconfigured to determine whether the object passes through the specificspace or not on the basis of the change in the output voltage from thesensor unit.
 19. A passage detection apparatus of an object according toclaim 18, further comprising: an aperture plate that is a plate-likemember and arranged at the end portion of the specific space at the sideof the inlet of the object in such a manner as to cross the passagedirection of the object, wherein the aperture plate is formed with anaperture that is a through-hole through which the object can pass, andthe aperture is formed to be smaller than the size of the section of thespecific space vertical to the passage direction of the object.
 20. Apassage detection apparatus of an object according to claim 19, furthercomprising: an element noise reducing shield member that is provided tocover the sensor unit and/or the vibration generating source, and/or acircuit noise reducing shield member that is configured to cover thedetermination unit for eliminating electrical noise applied to thedetermination unit.
 21. A passage detection apparatus of an objectaccording to claim 20, further comprising: a band pass filter that isconfigured to limit the frequency of the output from the sensor unit tothe band around the predetermined resonance frequency.